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1. (WO2017152451) FFS MODE ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR

Pub. No.:    WO/2017/152451    International Application No.:    PCT/CN2016/078755
Publication Date: Fri Sep 15 01:59:59 CEST 2017 International Filing Date: Sat Apr 09 01:59:59 CEST 2016
IPC: G02F 1/1343
H01L 21/77
H01L 27/12
Applicants: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
深圳市华星光电技术有限公司
Inventors: GE, Shimin
葛世民
Title: FFS MODE ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR
Abstract:
An FFS mode array substrate and manufacturing method therefor. The FFS mode array substrate comprises: a base layer; a second insulating layer (20) deposited on the base layer, a first through hole (20a) and a second through hole (20b) being formed on the second insulating layer (20); a pixel electrode layer (30) deposited on the second insulating layer (20), pixel electrodes being provided on the pixel electrode layer (30); a source (41) and a drain (42); and a third insulating layer (50) provided on the source (41), the drain (42), the pixel electrodes, and the second insulating layer (20).