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1. (WO2017151711) PHOTOCURABLE ELECTRON DEFICIENT OLEFIN-CONTAINING COMPOSITIONS
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Pub. No.: WO/2017/151711 International Application No.: PCT/US2017/020099
Publication Date: 08.09.2017 International Filing Date: 01.03.2017
IPC:
C08F 2/46 (2006.01) ,C08F 4/00 (2006.01) ,C08F 22/32 (2006.01) ,C09J 4/04 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
4
Polymerisation catalysts
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
22
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
30
Nitriles
32
Alpha-cyano-acrylic acid; Esters thereof
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
4
Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
02
Acrylmonomers
04
Cyanoacrylate monomers
Applicants:
WOODS, John G. [US/US]; US (US)
HENKEL IP & HOLDING GMBH [DE/DE]; Henkelstrasse 67 40589 Duesseldorf, DE
Inventors:
WOODS, John G.; US
PALLIARDI, Mary; US
SCHALL, Joel D.; US
JACOBINE, Anthony F.; US
Agent:
BAUMAN, Steven C.; US
CUMMINGS, James J.; US
PIOTROWSKI, James E.; US
CAMERON, Mary K.; US
LEHMANN, Sun Hee; US
Priority Data:
62/301,85101.03.2016US
Title (EN) PHOTOCURABLE ELECTRON DEFICIENT OLEFIN-CONTAINING COMPOSITIONS
(FR) COMPOSITIONS PHOTODURCISSABLES CONTENANT DES OLÉFINES DÉFICIENTES EN ÉLECTRONS
Abstract:
(EN) This invention relates to photocurable electron deficient olefin-containing compositions, such as those containing certain 2-cyanoacrylates, 2-cyanopentadienoates, methylidene malonates, and vinylidine cyanide, and photolatent bases. When exposed to radiation in the electromagnetic spectrum, the compositions show a delay cure property.
(FR) Cette invention concerne des compositions photodurcissables contenant des oléfines pauvres en électrons, telles que celles contenant certaines 2-cyanoacrylates, 2-cyanopentadiénoates, malonates de méthylidène, et cyanure de vinylidine, et bases photolatentes. Lorsqu'elles sont exposées à un rayonnement dans le spectre électromagnétique, les compositions présentent une propriété de retardement du durcissement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)