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1. (WO2017151639) IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE

Pub. No.:    WO/2017/151639    International Application No.:    PCT/US2017/019982
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Wed Mar 01 00:59:59 CET 2017
IPC: H01L 21/02
Applicants: APPLIED MATERIALS, INC.
Inventors: KAUFMAN-OSBORN, Tobin
WONG, Keith Tatseun
Title: IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE
Abstract:
Implementations described herein generally relate to processes for the fabrication of semiconductor devices in which a self-assembled monolayer (SAM) is used to achieve selective area deposition. Methods described herein relate to alternating SAM molecule and hydroxyl moiety exposure operations which may be utilized to form SAM layers suitable for blocking deposition of subsequently deposited materials.