Search International and National Patent Collections

1. (WO2017150388) EXPOSURE DEVICE, FLAT PANEL DISPLAY MANUFACTURING METHOD, DEVICE MANUFACTURING METHOD, LIGHT BLOCKING DEVICE AND EXPOSURE METHOD

Pub. No.:    WO/2017/150388    International Application No.:    PCT/JP2017/007186
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Sat Feb 25 00:59:59 CET 2017
IPC: G03F 7/20
H01L 21/68
Applicants: NIKON CORPORATION
株式会社ニコン
Inventors: AOKI, Atsuyuki
青木 淳行
MIZUHASHI, Kensuke
水橋 謙介
NAKAMURA, Takashi
中村 貴
NISHIKAWA, Jin
西川 仁
KANEKO, Hirokazu
金子 宏和
Title: EXPOSURE DEVICE, FLAT PANEL DISPLAY MANUFACTURING METHOD, DEVICE MANUFACTURING METHOD, LIGHT BLOCKING DEVICE AND EXPOSURE METHOD
Abstract:
Provided is an exposure method in which a plurality of projection optical units are provided that project the pattern of a mask (M) onto a substrate (P) and in which the pattern of the mask (M) is exposed onto the substrate (P) by moving the mask (M) and the substrate (P) relative to each other in an X direction. The exposure method includes: a first exposure step for projecting a pattern A onto an A region on the substrate (P) in a state where a -Y side end of a projection region that is projected onto the substrate (P) by the projection optical units is shielded from light at a first inclination angle; a step movement step for moving the substrate (P); and a second exposure step for projecting a pattern B onto a B region that at least partially overlaps the A region in a state where a +Y side end of the projection region is shielded from light at a second inclination angle.