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1. (WO2017149767) LASER ANNEALING DEVICE, MASK, THIN FILM TRANSISTOR, AND LASER ANNEALING METHOD

Pub. No.:    WO/2017/149767    International Application No.:    PCT/JP2016/056822
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Sat Mar 05 00:59:59 CET 2016
IPC: H01L 21/268
Applicants: SAKAI DISPLAY PRODUCTS CORPORATION
堺ディスプレイプロダクト株式会社
Inventors: NAKAGAWA, Hidetoshi
中川 英俊
Title: LASER ANNEALING DEVICE, MASK, THIN FILM TRANSISTOR, AND LASER ANNEALING METHOD
Abstract:
To provide a laser annealing device capable of performing annealing whereby electron mobility is different depending on the part, a mask, a thin film transistor, and a laser annealing method. A laser annealing device of the present invention is provided with a mask in which a plurality of openings are formed along the scanning direction, moves a substrate in the scanning direction, and irradiates the substrate with laser light via the openings. The openings respectively have first opening regions, which are aligned in the scanning direction, and which have a same shape, and some of the openings among the openings respectively have second opening regions continuous to the first opening regions in the predetermined direction with respect to the first opening regions.