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1. (WO2017149756) PARTICLE ANALYSIS DEVICE AND PARTICLE ANALYSIS METHOD

Pub. No.:    WO/2017/149756    International Application No.:    PCT/JP2016/056791
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Sat Mar 05 00:59:59 CET 2016
IPC: G01N 15/12
Applicants: HITACHI, LTD.
株式会社日立製作所
Inventors: TAKAKURA Tatsuki
高倉 樹
ISHIGE Yu
石毛 悠
Title: PARTICLE ANALYSIS DEVICE AND PARTICLE ANALYSIS METHOD
Abstract:
A particle analysis device of the present invention is equipped with a measuring unit, and a measuring container that is provided with: a substrate having a plurality of fine pores; a first flow channel, which is in contact with, on the front surface of the substrate, the fine pores, and which separates some of the fine pores from each other; and a second flow channel in contact with, on the rear surface of the substrate, the fine pores. The measuring unit measures a flowing current or electric resistance between each of a plurality of detection electrodes that are provided on the front surface of the substrate or inside of the first flowing channel, and at least one facing electrode that is provided on the rear surface of the substrate or inside of the second flowing channel.