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1. (WO2017149739) PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT

Pub. No.:    WO/2017/149739    International Application No.:    PCT/JP2016/056684
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Fri Mar 04 00:59:59 CET 2016
IPC: C23C 16/455
C23C 16/509
H01L 21/205
H05H 1/24
H05H 1/46
Applicants: CORE TECHNOLOGY, INC.
コアテクノロジー株式会社
ASKAGI CORPORATION
株式会社アスカギ
Inventors: YOSHIMURA Toshiaki
吉村俊秋
MINOWA Hiroyuki
箕輪裕之
SHEK Lung Kei Amos
石龍基
Title: PLASMA TREATMENT DEVICE AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT
Abstract:
The present invention improves the in-plane uniformity of films formed via a plasma treatment. Thus, a plasma treatment device configured so as to discharge a processing gas toward a counter electrode after said gas is introduced between an electrode plate and a shower plate and passes through a plurality of small holes formed in the shower plate, the plasma treatment device being characterized in that: a diffusion plate having a plurality of small holes and positioned so as to be substantially parallel to the shower plate is provided between the electrode plate and the shower plate; the processing gas is introduced between the electrode plate and the diffusion plate, reaches the shower plate by passing through the small holes in the diffusion plate, in order, and flows toward the counter electrode from the small holes in the shower plate; the small holes formed in the diffusion plate and the shower plate grow increasingly smaller in diameter in the plates that are downstream in the direction in which the processing gas flows; and the plates become increasingly less porous in the plates that are upstream in the direction in which the processing gas flows.