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1. (WO2017149738) PLASMA TREATMENT DEVICE, AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT

Pub. No.:    WO/2017/149738    International Application No.:    PCT/JP2016/056683
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Fri Mar 04 00:59:59 CET 2016
IPC: H05H 1/46
C23C 16/509
H01L 21/205
H05H 1/24
Applicants: CORE TECHNOLOGY, INC.
コアテクノロジー株式会社
ASKAGI CORPORATION
株式会社アスカギ
Inventors: YOSHIMURA Toshiaki
吉村俊秋
MINOWA Hiroyuki
箕輪裕之
SHEK Lung Kei Amos
石龍基
Title: PLASMA TREATMENT DEVICE, AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT
Abstract:
The present invention improves the in-plane uniformity of films formed via a plasma treatment. A plasma treatment device equipped with an electrode plate provided in a reaction vessel, a counter electrode provided inside the reaction vessel in parallel with and so as to face the electrode plate, a transmission channel that supplies power having a prescribed frequency from outside the reaction vessel to the electrode plate, and connects to the electrode plate on the side thereof that does not face the counter electrode, and a vessel-shaped insulative body that houses the electrode plate in the interior thereof, and is provided inside the reaction vessel, the plasma treatment device being characterized in that the non-facing side of the electrode plate is tightly adhered to the inside floor surface of the vessel-shaped insulative body, a lateral surface of the electrode plate is tightly adhered to an inside surface of the vessel-shaped insulative body, and the opening edge section of the vessel-shaped insulative body is formed so as to project on the counter electrode side.