Search International and National Patent Collections
|1. (WO2017149738) PLASMA TREATMENT DEVICE, AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT|
|Applicants:||CORE TECHNOLOGY, INC.
SHEK Lung Kei Amos
|Title:||PLASMA TREATMENT DEVICE, AND STRUCTURE OF REACTION VESSEL FOR PLASMA TREATMENT|
The present invention improves the in-plane uniformity of films formed via a plasma treatment. A plasma treatment device equipped with an electrode plate provided in a reaction vessel, a counter electrode provided inside the reaction vessel in parallel with and so as to face the electrode plate, a transmission channel that supplies power having a prescribed frequency from outside the reaction vessel to the electrode plate, and connects to the electrode plate on the side thereof that does not face the counter electrode, and a vessel-shaped insulative body that houses the electrode plate in the interior thereof, and is provided inside the reaction vessel, the plasma treatment device being characterized in that the non-facing side of the electrode plate is tightly adhered to the inside floor surface of the vessel-shaped insulative body, a lateral surface of the electrode plate is tightly adhered to an inside surface of the vessel-shaped insulative body, and the opening edge section of the vessel-shaped insulative body is formed so as to project on the counter electrode side.