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|1. (WO2017149689) DEFECT INSPECTION DEVICE, PATTERN CHIP, AND DEFECT INSPECTION METHOD|
|Applicants:||HITACHI HIGH-TECHNOLOGIES CORPORATION
|Title:||DEFECT INSPECTION DEVICE, PATTERN CHIP, AND DEFECT INSPECTION METHOD|
A defect inspection device that adjusts the focus of a detection optical system and detects a defect on the surface of a sample to be inspected by irradiating illumination light having a shape extending in a first direction onto the surface of the sample or the surface of a pattern chip and detecting illumination light that is scattered by the surface of the sample or the surface of the pattern chip, the defect inspection device being characterized in that: the pattern chip has a dot pattern area in which a plurality of dots are arrayed in a plurality of rows and a plurality of columns; of the plurality of dots arrayed in the dot pattern area, the dots corresponding to each row in the first direction have a minimum interval in a second direction orthogonal to the first direction that is narrower than the width of the illumination light; and the minimum interval of the plurality of dots arrayed in the dot pattern area is larger than the resolution of the detection optical system.