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1. (WO2017149689) DEFECT INSPECTION DEVICE, PATTERN CHIP, AND DEFECT INSPECTION METHOD

Pub. No.:    WO/2017/149689    International Application No.:    PCT/JP2016/056330
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Thu Mar 03 00:59:59 CET 2016
IPC: G01N 21/956
H01L 21/66
Applicants: HITACHI HIGH-TECHNOLOGIES CORPORATION
株式会社日立ハイテクノロジーズ
Inventors: URANO Yuta
浦野 雄太
SHIBATA Yukihiro
芝田 行広
HONDA Toshifumi
本田 敏文
YOSHITAKE Yasuhiro
吉武 康裕
FUKUSHIMA Hideki
福島 英喜
Title: DEFECT INSPECTION DEVICE, PATTERN CHIP, AND DEFECT INSPECTION METHOD
Abstract:
A defect inspection device that adjusts the focus of a detection optical system and detects a defect on the surface of a sample to be inspected by irradiating illumination light having a shape extending in a first direction onto the surface of the sample or the surface of a pattern chip and detecting illumination light that is scattered by the surface of the sample or the surface of the pattern chip, the defect inspection device being characterized in that: the pattern chip has a dot pattern area in which a plurality of dots are arrayed in a plurality of rows and a plurality of columns; of the plurality of dots arrayed in the dot pattern area, the dots corresponding to each row in the first direction have a minimum interval in a second direction orthogonal to the first direction that is narrower than the width of the illumination light; and the minimum interval of the plurality of dots arrayed in the dot pattern area is larger than the resolution of the detection optical system.