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1. (WO2017149663) SUBSTRATE TREATMENT APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

Pub. No.:    WO/2017/149663    International Application No.:    PCT/JP2016/056275
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Wed Mar 02 00:59:59 CET 2016
IPC: H01L 21/324
H01L 21/20
H01L 21/265
H01L 21/268
Applicants: KOKUSAI ELECTRIC CORPORATION
株式会社KOKUSAI ELECTRIC
Inventors: HIROCHI, Yukitomo
廣地 志有
Title: SUBSTRATE TREATMENT APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
Abstract:
Provided is art having: a treatment chamber, into which a substrate holding tool holding a substrate and a heat insulating plate are carried, and in which the substrate is treated; a heating apparatus having a microwave supply unit that supplies microwaves to the inside of the treatment chamber; a gas supply unit that supplies a cooling gas to the inside of the treatment chamber; and a control unit configured to control the heating apparatus and the gas supply unit such that the substrate is maintained at a predetermined temperature by supplying the cooling gas from the gas supply unit at the time of heating the substrate by means of the heating apparatus.