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1. (WO2017149631) POROUS POLISHING TOOL AND POLISHING TOOL INCLUDING SAME

Pub. No.:    WO/2017/149631    International Application No.:    PCT/JP2016/056147
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Tue Mar 01 00:59:59 CET 2016
IPC: B24D 3/32
B24D 11/00
Applicants: XEBEC TECHNOLOGY CO., LTD.
株式会社ジーベックテクノロジー
Inventors: FUJIWARA, Norimasa
藤原 規雅
MURAI, Keiichi
村井 啓一
Title: POROUS POLISHING TOOL AND POLISHING TOOL INCLUDING SAME
Abstract:
The objective of the invention is to provide a porous polishing tool with which the ratio between abrasive grains contacting an object being polished and a resin part contacting the object being polished can be maintained within a certain range during polishing, and with which a precise surface accuracy can be achieved without requiring complicated adjustments for stabilizing a device even in cases where a low-skill person uses the polishing tool by attaching the same to an automated device. This objective is achieved by a porous polishing tool comprising an anisotropically elastic foam body, a polymer, and abrasive grains.