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1. (WO2017149428) SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE

Pub. No.:    WO/2017/149428    International Application No.:    PCT/IB2017/051122
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Tue Feb 28 00:59:59 CET 2017
IPC: H01L 29/786
G02F 1/1368
G09F 9/30
H01L 21/336
H01L 51/50
H05B 33/14
Applicants: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventors: YAMAZAKI, Shunpei
KOEZUKA, Junichi
OKAZAKI, Kenichi
NAKAZAWA, Yasutaka
Title: SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE
Abstract:
The field-effect mobility and reliability of a transistor including an oxide semiconductor film are improved. One embodiment of the present invention is a semiconductor device which includes a gate electrode, an insulating film over the gate electrode, an oxide semiconductor film over the insulating film, and a pair of electrodes over the oxide semiconductor film. The oxide semiconductor film includes a first oxide semiconductor film, a second oxide semiconductor film over the first oxide semiconductor film, and a third oxide semiconductor film over the second oxide semiconductor film. The first oxide semiconductor film, the second oxide semiconductor film, and the third oxide semiconductor film include the same element. The second oxide semiconductor film includes a region having lower crystallinity than one or both of the first oxide semiconductor film and the third oxide semiconductor film.