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1. (WO2017149009) METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Pub. No.:    WO/2017/149009    International Application No.:    PCT/EP2017/054761
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Thu Mar 02 00:59:59 CET 2017
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: VAN LEEST, Adriaan, Johan
TSIATMAS, Anagnostis
HINNEN, Paul, Christiaan
MC NAMARA, Elliott, Gerard
VERMA, Alok
THEEUWES, Thomas
CRAMER, Hugo, Augustinus, Joseph
DE LA FUENTE VALENTIN, Maria, Isabel
VAN WITTEVEEN, Koen
ZAAL, Martijn, Maria
WANG, Shu-jin
Title: METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
Abstract:
A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.