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1. (WO2017148982) METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Pub. No.:    WO/2017/148982    International Application No.:    PCT/EP2017/054714
Publication Date: Sat Sep 09 01:59:59 CEST 2017 International Filing Date: Thu Mar 02 00:59:59 CET 2017
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: VAN LEEST, Adriaan, Johan
TSIATMAS, Anagnostis
HINNEN, Paul, Christiaan
MC NAMARA, Elliott, Gerard
VERMA, Alok
THEEUWES, Thomas
CRAMER, Hugo, Augustinus, Joseph
Title: METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
Abstract:
A method of determining overlay of a patterning process, the method including: illuminating a substrate with a radiation beam such that a beam spot on the substrate is filled with one or more physical instances of a unit cell, the unit cell having geometric symmetry at a nominal value of overlay; detecting primarily zeroth order radiation redirected by the one or more physical instances of the unit cell using a detector; and determining, by a hardware computer system, a non-nominal value of overlay of the unit cell from values of an optical characteristic of the detected radiation.