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1. (WO2017148734) SUBSTRATE HOLDING DEVICE WITH SUPPORT PROTRUSIONS WHICH ORIGINATE FROM AN ANNULAR GROOVE
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Pub. No.: WO/2017/148734 International Application No.: PCT/EP2017/053862
Publication Date: 08.09.2017 International Filing Date: 21.02.2017
IPC:
C23C 16/458 (2006.01) ,C23C 14/50 (2006.01) ,C23C 14/54 (2006.01) ,H01L 21/687 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
458
characterised by the method used for supporting substrates in the reaction chamber
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
50
Substrate holders
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
54
Controlling or regulating the coating process
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
Applicants:
AIXTRON SE [DE/DE]; Dornkaulstraße 2 52134 Herzogenrath, DE
Inventors:
O'DOWD, James; GB
CLAESSENS, Daniel; DE
FERON, Olivier; BE
Agent:
GRUNDMANN, Dirk; DE
MÜLLER, Enno; DE
RIEDER, Hans-Joachim; DE
BRÖTZ, Helmut; DE
BOURREE, Hendrik; DE
Priority Data:
10 2016 103 530.029.02.2016DE
Title (EN) SUBSTRATE HOLDING DEVICE WITH SUPPORT PROTRUSIONS WHICH ORIGINATE FROM AN ANNULAR GROOVE
(FR) DISPOSITIF DE RETENUE DE SUBSTRAT MUNI DE PARTIES SAILLANTES DE SUPPORT FAISANT SAILLIE D'UNE RAINURE ANNULAIRE
(DE) SUBSTRATHALTEVORRICHTUNG MIT AUS EINER RINGNUT ENTSPRINGENDEN TRAGVORSPRÜNGEN
Abstract:
(EN) The invention relates to a device for holding at least one substrate (20) in a processing chamber of a CVD or PVD reactor, having a flat upper face in which at least one bearing pocket (2) for receiving the at least one substrate (20) is located, said bearing pocket being delimited by at least one positioning edge (3). The bearing pocket (2) has a bearing pocket base (4) from which a support protrusion (8) originates in the vicinity of the positioning edge (3), said support protrusion forming a support zone (9) which is surrounded by a lateral wall (10) and which lies on a support plane (E) that is vertically spaced farther from a base (6) of a groove (5) surrounding the support protrusion (8) than from the bearing pocket base (4). In order to increase the temperature homogeneity on the upper face of the substrate, the groove (5) extends into a depression (11), the vertical level of which lies between the base (6) of the groove (5) and the bearing pocket base (4). The support protrusion (8) and/or the groove (5) surrounding the support protrusion (8) is/are arranged at a horizontal distance from the positioning edge (3).
(FR) L'invention concerne un dispositif pour maintenir au moins un substrat (20) dans une chambre de traitement d'un réacteur de dépôt chimique en phase vapeur (CVD) ou de dépôt physique en phase vapeur (PVD), dans la face supérieure plate duquel se situe au moins une poche de support (2) qui est limitée par au moins un flanc de positionnement et sert à recevoir au moins un substrat (20), ladite poche de support (2) présentant un fond de poche de support (4) d'où fait saillie une partie saillante de support (8) au voisinage du flanc de positionnement (3), ladite partie saillante de support constituant une zone d'appui ()) qui est entourée par une paroi latérale (10) et se situe dans un plan d'appui (E) qui présente un écart vertical par rapport au fond (6) d'une rainure (5) entourant la partie saillante (8) qui est plus important que par rapport au fond de la poche de support (4). Afin de renforcer l'homogénéité des températures sur la face supérieure du substrat, selon l'invention, la rainure (5) s'étend dans un renfoncement (11) dont le niveau vertical se situe entre le fond (6) de la rainure (5) et le fond de la poche de support (4). La partie saillante (8) et/ou la rainure (5) entourant la partie saillante (8) présentent une distance horizontale par rapport au flanc de positionnement.
(DE) Die Erfindung betrifft eine Vorrichtung zur Halterung mindestens eines Sub- strates (20) in einer Prozesskammer eines CVD-oder PVD-Reaktors, in dessen flacher Oberseite sich zumindest eine von zumindest einer Positionierflanke (3) begrenzte Lagertasche (2) zur Aufnahme des mindestens einen Substrates (20) befindet, wobei die Lagertasche (2) einen Lagertaschenboden (4) aufweist, aus dem in der Nachbarschaft der Positionierflanke (3) ein Tragvorsprung (8) entspringt, der eine von einer Seitenwand (10) umgebene Auflagezone (9) ausbildet, die in einer Auflageebene (E) liegt, welche von einem Boden (6) einer den Tragvorsprung (8) umgebenen Nut (5) einen größeren Vertikalabstand aufweist als vom Lagertaschenboden (4). Zur Erhöhung der Temperaturhomogenität auf der Oberseite des Substrates ist vorgesehen, dass sich die Nut (5) in einer Vertiefung (11) erstreckt, deren Vertikalniveau zwischen dem Boden (6) der Nut (5) und dem Lagertaschenboden (4) liegt. Der Tragvorsprung (8) und/oder die den Tragvorsprung (8) umgebende Nut (5) besitzen einen horizontalen Abstand von der Positionierflanke (3).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)