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1. (WO2017148394) LIGA FABRICATION PROCESS
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Pub. No.: WO/2017/148394 International Application No.: PCT/CN2017/075351
Publication Date: 08.09.2017 International Filing Date: 01.03.2017
IPC:
G03F 7/04 (2006.01) ,C25D 1/10 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
1
Electroforming
10
Moulds; Masks; Masterforms
Applicants:
MASTER DYNAMIC LIMITED [CN/CN]; Unit 108B-109, 1/F, Biotech Centre 1 No. 9 Science Park West Avenue Shatin, New Territories Hong Kong, CN
Inventors:
WANG, Yingnan; CN
KONG, Ching Tom; CN
Agent:
CHINA SINDA INTELLECTUAL PROPERTY LTD.; B11th Floor, Focus Place, 19 Financial Street, Xicheng District Beijing 100033, CN
Priority Data:
16102324.529.02.2016HK
Title (EN) LIGA FABRICATION PROCESS
(FR) PROCÉDÉ DE FABRICATION DE LIGA
Abstract:
(EN) Provided is a process of forming a three-dimensional micro component, including the step of (i) forming a three-dimensional (3D) geometry contour within a photoresist material using two-photon absorption polymerization, wherein the three-dimensional geometry contour forms a cross-linked polymeric contour defining an outer surface portion of a micro component upon the three-dimensional geometry portion formed in the photoresist having been baked; and (ii) applying a UV (ultraviolet) polymerization process so as to cross-link polymeric material of the photoresist adjacent said three-dimensional geometry contour.
(FR) L'invention concerne un procédé de formation d'un micro-élément tridimensionnel, comprenant l'étape consistant à (i) former un contour de géométrie tridimensionnelle (3D) dans un matériau de photorésine à l'aide d'une polymérisation par absorption à deux photons, le contour de géométrie tridimensionnelle formant un contour polymère réticulé définissant une partie surface externe d'un micro-élément sur la partie géométrie tridimensionnelle formée dans la photorésine ayant été cuite; et (ii) appliquer un procédé de polymérisation UV (ultraviolet) de façon à réticuler un matériau polymère de la photorésine adjacent audit contour de géométrie tridimensionnelle.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)