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1. (WO2017145484) WATER-BASED CURABLE COMPOSITION AND WATER-SOLUBLE PHOTOPOLYMERIZATION INITIATOR
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Pub. No.: WO/2017/145484 International Application No.: PCT/JP2016/085652
Publication Date: 31.08.2017 International Filing Date: 30.11.2016
IPC:
C08F 2/48 (2006.01) ,B41J 2/01 (2006.01) ,B41M 5/00 (2006.01) ,C08F 30/02 (2006.01) ,C09D 11/38 (2014.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
J
TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2
Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
005
characterised by bringing liquid or particles selectively into contact with a printing material
01
Ink jet
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
M
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
5
Duplicating or marking methods; Sheet materials for use therein
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
30
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
02
containing phosphorus
[IPC code unknown for C09D 11/38]
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
横井 和公 YOKOI, Kazuhiro; JP
津山 博昭 TSUYAMA, Hiroaki; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2016-03465325.02.2016JP
Title (EN) WATER-BASED CURABLE COMPOSITION AND WATER-SOLUBLE PHOTOPOLYMERIZATION INITIATOR
(FR) COMPOSITION DURCISSABLE AQUEUSE ET INITIATEUR DE PHOTOPOLYMÉRISATION HYDROSOLUBLE
(JA) 水性硬化性組成物、及び、水溶性光重合開始剤
Abstract:
(EN) A water-based curable composition comprising: a water-soluble photopolymerization initiator having an acylphosphine oxide structure in which an aromatic acyl group bonded to the phosphorus atom has one or more carbonyl groups directly bonded to the aromatic ring; water; and a polymerizable compound. The water-soluble photopolymerization initiator is novel and is a compound represented by formula 1-1 or formula 2-1.
(FR) La présente invention concerne une composition durcissable aqueuse comprenant : un initiateur de photopolymérisation hydrosoluble ayant une structure d'oxyde d'acylphosphine, un groupe acyle aromatique lié à l'atome de phosphore ayant au moins un groupe carbonyle directement lié au cycle aromatique; de l'eau; et un composé polymérisable. L'initiateur de photopolymérisation soluble dans l'eau est nouveau et est un composé représenté par la formule 1-1 ou la formule 2-1.
(JA) 水性硬化性組成物は、アシルホスフィンオキシド構造におけるリン原子に結合する芳香族アシル基の芳香環に更に1つ以上のカルボニル基が直接結合した構造を有する水溶性光重合開始剤、水、及び、重合性化合物を含む。また、新規な水溶性光重合開始剤は、式1-1又は式2-1で表される化合物である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)