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1. (WO2017144277) SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
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Pub. No.: WO/2017/144277 International Application No.: PCT/EP2017/052806
Publication Date: 31.08.2017 International Filing Date: 09.02.2017
IPC:
G03F 7/20 (2006.01) ,H01L 21/677 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VERVOORDELDONK, Michael, Johannes; NL
LOF, Joeri; NL
Agent:
RAS, Michael; NL
Priority Data:
16157034.624.02.2016EP
Title (EN) SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
(FR) SYSTÈME DE MANIPULATION DE SUBSTRAT ET APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) There is provided a substrate handling system (200) for handling a substrate (W), comprising a holder (202), a rotation device (206) and a mover (204). The holder is for holding the substrate. The rotation device is for rotating the holder around an axis (208) perpendicular to a plane. The mover is for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus comprising the substrate handling system. The substrate handling system may comprise a coupling device (210) arranged to couple the holder to one of the mover and the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the one of the mover and the rotation device in a second situation.
(FR) La présente invention concerne un système de manipulation de substrat (200) pour traiter un substrat (W), comprenant un support (202), un dispositif de rotation (206) et un moyen de déplacement (204). Le support est destiné à maintenir le substrat. Le dispositif de rotation est destiné à faire tourner le support autour d'un axe (208) perpendiculairement à un plan. Le moyen de déplacement est destiné à déplacer le support le long d'un chemin dans le plan par rapport à l'axe. En outre, il est prévu un appareil lithographique comprenant le système de manipulation de substrat. Le système de manipulation de substrat peut comprendre un dispositif de couplage (210) agencé pour coupler le support à l'un du moyen de déplacement et du dispositif de rotation dans une première situation. Le dispositif de couplage peut être agencé pour découper le support de l'un du moyen de déplacement et du dispositif de rotation dans une seconde situation.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)