Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2017138149) SOLUTION TANK DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/138149 International Application No.: PCT/JP2016/054141
Publication Date: 17.08.2017 International Filing Date: 12.02.2016
IPC:
G01N 27/00 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
27
Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
Applicants:
株式会社日立製作所 HITACHI, LTD. [JP/JP]; 東京都千代田区丸の内一丁目6番6号 6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008280, JP
Inventors:
松井 一真 MATSUI, Kazuma; JP
柳 至 YANAGI, Itaru; JP
Agent:
特許業務法人藤央特許事務所 TOU-OU PATENT FIRM; 東京都港区虎ノ門一丁目16番4号アーバン虎ノ門ビル Urban Toranomon Bldg., 16-4, Toranomon 1-chome, Minato-ku, Tokyo 1050001, JP
Priority Data:
Title (EN) SOLUTION TANK DEVICE
(FR) DISPOSITIF RÉSERVOIR DE SOLUTION
(JA) 溶液槽デバイス
Abstract:
(EN) A solution tank device has an insulating thin film that allows an object of measurement to pass therethrough and has a thickness of 1 μm or less, a first solution tank that supports one of the two surfaces of the thin film, and a first conductive structure that is provided at a location where contact friction occurs between the first solution tank and an external object and has a sheet resistance of 1013 Ω or less.
(FR) L'invention concerne un dispositif réservoir de solution comportant un film mince isolant permettant le passage d'un objet de mesure à travers ce dernier et ayant une épaisseur inférieure ou égale à 1 µm, un premier réservoir de solution qui supporte l'une des deux surfaces du film mince, et une première structure conductrice disposée à un emplacement au niveau duquel intervient un contact de frottement entre le premier réservoir de solution et un objet externe et ayant une résistance de couche inférieure ou égale à 1013 Ω.
(JA)  溶液槽デバイスは、測定対象を通過させ1μm以下の厚さを有する絶縁性の薄膜と、前記薄膜の両面のうち一方の面側を支持する第1溶液槽と、前記第1溶液槽と外部の物体との間で接触摩擦が生じる箇所にシート抵抗1013Ω以下の第1導電性構造を有する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
US20180252696