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1. (WO2017136945) ORGANOMETALLIC COMPOUND AND METHOD
Note: Text based on automatic Optical Character Recognition processes. Please use the PDF version for legal matters

CLAIMS

What is claimed is:

1. An organometallic compound of Formula 1 :


wherein:

A is selected from the group consisting of - R^2, -N(R4)(CH2)nN(R5R6),

-N=C( R4R5)(NR R7), OCOR1, halo and Y;

R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H;

R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms;

Y is selected from the group consisting of a 3- to 13-membered heterocyclic radical containing at least one nitrogen atom;

R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms;

M is selected from the group consisting of Si, Ge, Sn, Ti, Zr and Hf;

x is an integer from 1 to 3; and

n is an integer from 1 to 4.

2. The compound of claim 1 , wherein M is selected from the group consisting of Si, Ge and Sn.

3. The compound of claim 2, wherein M is Si.

4. The compound of claim 3, wherein A is selected from the group consisting of -NR^2, -N(R4)(CH2)nN(R5R6), -N=C(NR4R5)( R R7), OCOR1, halo and Y.

5. The compound of claim 4, wherein A is selected from the group consisting of acetate, tetraethylguanidinyl, dimethylethylenediaminyl, bromo, iodo, -NR!R2 and Y.

6. The compound of claim 5, wherein A is -NR!R2

7. The compound of claim 6, wherein R1 and R2 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

8. The compound of claim 7, wherein wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl.

9. The compound of claim 5, wherein A is Y.

10. The compound of claim 9, wherein Y is selected from the group consisting of aziridinyl, azetidinyl, pyrrolidinyl, pyrrolyl, piperidinyl, pyridinyl, azepanyl, and azepinyl.

11. The compound of claim 10, wherein Y is selected from the group consisting of aziridinyl, azetidinyl and pyrrolidinyl.

12. The compound of claim 8 or 11, wherein R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H.

13. The compound of claim 12, wherein R1 and R2 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

14. The compound of claim 13, wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl.

15. The compound of claim 8 or 11, wherein R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms.

16. The compound of claim 15, wherein R3 is a linear or branched acyclic alkyl group having from 1 to 4 carbon atoms.

17. The compound of claim 16, wherein R3 is selected from the group consisting of methyl and ethyl.

18. The compound of claim 17, wherein R3 is a methyl group.

19. The compound of claim 8 or 11, wherein R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

20. The compound of claim 19, wherein R4, R5, R6 and R7 are independently selected from the group consisting of methyl and ethyl.

21. The compound of claim 5 wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl, Y is pyrrolidinyl, and R3 is selected from the group consisting of methyl and ethyl.

22. A method for forming a metal oxide film by a vapour deposition process, the method comprising the steps of:

a. Providing at least one substrate having functional O-H groups covering the surface,

b. delivering to said substrate at least one compound of Formula 1 in the gaseous phase,

c. purging the substrate with purge gas,

d. delivering to said substrate an oxygen source in the gaseous phase, e. purging the substrate with purge gas,

f. repeating steps b) through e) until a desired thickness of metal oxide has been deposited.

23. The method of claim 22, wherein M is Si.

24. The method of claim 23, wherein A is selected from the group consisting of -NR^R2, - N(R4)(CH2)nN(R5R6), -N=C(NR4R5)( R R7), OCOR1, halo and Y.

25. The method of claim 24, wherein A is selected from the group consisting of acetate, tetraethylguanidinyl, dimethylethylenediaminyl, bromo, iodo, -NR!R2 and Y.

26. The method of claim 25, wherein A is -NR!R2

27. The method of claim 26, wherein R1 and R2 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

28. The method of claim 27, wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl.

29. The method of claim 25, wherein A is Y.

30. The method of claim 29, wherein Y is selected from the group consisting of aziridinyl, azetidinyl, pyrrolidinyl, pyrrolyl, piperidinyl, pyridinyl, azepanyl, and azepinyl.

31. The method of claim 30, wherein Y is selected from the group consisting of aziridinyl, azetidinyl and pyrrolidinyl.

32. The method of claim 28 or 31, wherein R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H.

33. The method of claim 32, wherein R1 and R2 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

34. The method of claim 33, wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl.

35. The method of claim 28 or 31, wherein R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms.

36. The method of claim 35, wherein R3 is a linear or branched acyclic alkyl group having from 1 to 4 carbon atoms.

37. The method of claim 36, wherein R3 is selected from the group consisting of methyl and ethyl.

38. The method of claim 37, wherein R3 is a methyl group.

39. The method of claim 28 or 31, wherein R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms.

40. The method of claim 39, wherein R4, R5, R6 and R7 are independently selected from the group consisting of methyl and ethyl.

41. The method of claim 25 wherein R1 and R2 are independently selected from the group consisting of methyl, ethyl and isobutyl, Y is pyrrolidinyl, and R3 is selected from the group consisting of methyl and ethyl.

42. The method of claim 41, wherein the oxygen source is selected from H2O in gaseous phase, H2O2 in gaseous phase, O2, O3 and hydrazine.

43. The method of claim 41 wherein the vapour deposition process is chemical vapour deposition.

44. The method of claim 41 wherein the vapour deposition process is atomic layer deposition.