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1. (WO2017135715) GROUP 4 METAL ELEMENT-CONTAINING COMPOUND, METHOD FOR PREPARING SAME, PRECURSOR COMPOSITION CONTAINING SAME FOR FILM DEPOSITION, AND METHOD FOR DEPOSITING FILM USING SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/135715 International Application No.: PCT/KR2017/001161
Publication Date: 10.08.2017 International Filing Date: 03.02.2017
IPC:
C07F 7/00 (2006.01) ,C23C 16/455 (2006.01) ,C23C 16/30 (2006.01) ,C23C 16/44 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
Applicants:
주식회사 유피케미칼 UP CHEMICAL CO., LTD. [KR/KR]; 경기도 평택시 산단로197번길 81 (칠괴동) (Chilgoe-dong), 81, Sandan-ro 197beon-gil, Pyeongtaek-si Gyeonggi-do 17749, KR
Inventors:
한원석 HAN, Won Seok; KR
고원용 KOH, Wonyong; KR
박명호 PARK, Myeong-Ho; KR
Agent:
특허법인 엠에이피에스 MAPS INTELLECTUAL PROPERTY LAW FIRM; 서울특별시 강남구 테헤란로8길 37, 8층 (역삼동, 한동빌딩) (Yeoksam-dong, Handong Bldg.), 8F 37, Teheran-ro 8-gil Gangnam-gu Seoul 06239, KR
Priority Data:
10-2016-001320303.02.2016KR
Title (EN) GROUP 4 METAL ELEMENT-CONTAINING COMPOUND, METHOD FOR PREPARING SAME, PRECURSOR COMPOSITION CONTAINING SAME FOR FILM DEPOSITION, AND METHOD FOR DEPOSITING FILM USING SAME
(FR) COMPOSÉ CONTENANT UN MÉTAL DU GROUPE 4, SON PROCÉDÉ DE PRÉPARATION, COMPOSITION DE PRÉCURSEUR CONTENANT CELUI-CI POUR LE DÉPÔT DE FILM, ET PROCÉDÉ DE DÉPÔT DE FILM L'UTILISANT
(KO) 4 족 금속 원소-함유 화합물, 이의 제조 방법, 이를 포함하는 막 증착용 전구체 조성물, 및 이를 이용하는 막의 증착 방법
Abstract:
(EN) Provided are: a novel Group 4 metal element-containing compound, a method for preparing the Group 4 metal element-containing compound, a precursor composition containing the Group 4 metal element-containing compound for film deposition, and a method for depositing a Group 4 metal element-containing film using the precursor composition.
(FR) L'invention concerne un nouveau composé contenant un métal du groupe 4, un procédé de préparation du composé contenant un métal du groupe 4, une composition de précurseur contenant le composé contenant un métal du groupe 4 pour le dépôt d'un film, et un procédé de dépôt d'un film contenant un métal du groupe 4 utilisant la composition de précurseur.
(KO) 신규한 4 족 금속 원소-함유 화합물, 상기 4 족 금속 원소-함유 화합물의 제조 방법, 상기 4 족 금속 원소-함유 화합물을 포함하는 막 증착용 전구체 조성물, 및 상기 전구체 조성물을 이용하는 4 족 금속 원소-함유 막의 증착 방법을 제공한다.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)
Also published as:
CN107614507US20180162882JP2018521996