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1. (WO2017135542) WAFER CLEANING APPARTAUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/135542 International Application No.: PCT/KR2016/009944
Publication Date: 10.08.2017 International Filing Date: 06.09.2016
IPC:
H01L 21/02 (2006.01) ,H01L 21/67 (2006.01) ,H01L 21/687 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
Applicants:
(주)이오테크닉스 EO TECHNICS CO.,LTD. [KR/KR]; 경기도 안양시 동안구 동편로 91 91, Dongpyeon-ro Dongan-gu, Anyang-si, Gyeonggi-do 13930, KR
Inventors:
이교준 LEE, Gyo Jun; KR
조규환 CHO, Kyu Hwan; KR
정현택 JUNG, Hyun Taek; KR
김기수 KIM, Ki Soo; KR
Agent:
리앤목 특허법인 Y.P.LEE, MOCK & PARTNERS; 서울시 강남구 언주로 30길 13 대림아크로텔 12층 12F Daelim Acrotel, 13 Eonju-ro 30-gil Gangnam-gu, Seoul 06292, KR
Priority Data:
10-2016-001465605.02.2016KR
Title (EN) WAFER CLEANING APPARTAUS
(FR) APPAREIL DE NETTOYAGE DE TRANCHE
(KO) 웨이퍼 세정 장치
Abstract:
(EN) The present invention relates to a wafer cleaning apparatus. The wafer cleaning apparatus, according to one embodiment of the present inention, comprises: a housing having a cylindrical shape of which the upper surface is open; a wafer chuck, arranged inside the housing, for supporting a wafer; a cleansing solution spraying device for spraying a cleansing fluid on the wafer; and a spraying portion, which is arranged on the upper surface of the housing, for spraying a gas having a specific flow velocity while maintaining a specific spray angle with the upper surface.
(FR) La présente invention concerne un appareil de nettoyage de tranche. L'appareil de nettoyage de tranche, selon un mode de réalisation, comprend : un boîtier présentant une forme cylindrique dont la surface supérieure est ouverte; un support de tranche agencé à l'intérieur du boîtier pour porter une tranche; un dispositif de pulvérisation de solution de nettoyage pour pulvériser un liquide de nettoyage sur la tranche; et une partie de projection, qui est agencée sur la surface supérieure du boîtier, pour projeter un gaz ayant une vitesse d'écoulement spécifique tout en maintenant un angle de projection spécifique avec la surface supérieure.
(KO) 본 발명은 웨이퍼를 세정하기 위한 웨이퍼 세정 장치에 관한 것이다. 본 발명의 일 실시예에 따른 웨이퍼 세정 장치는, 상부면이 개방된 원통 형상의 하우징; 상기 하우징 내부에 배치되어 웨이퍼를 지지하는 웨이퍼 척; 상기 웨이퍼에 세정 유체를 분사하는 세정액 분사 장치; 및 상기 하우징의 상부면에 배치되어 상기 상부면과 소정의 분사 각도를 이룬 채, 소정의 유속을 구비하는 기체를 분사하는 분사부;를 포함할 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)