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1. (WO2017135349) CYLINDRICAL TARGET PRODUCTION METHOD AND CYLINDRICAL TARGET
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/135349 International Application No.: PCT/JP2017/003710
Publication Date: 10.08.2017 International Filing Date: 02.02.2017
IPC:
C23C 14/34 (2006.01) ,G01B 21/30 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
21
Measuring arrangements or details thereof in so far as they are not adapted to particular types of measuring means of the other groups of this subclass
30
for measuring roughness or irregularity of surfaces
Applicants:
住友化学株式会社 SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 東京都中央区新川二丁目27番1号 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260, JP
Inventors:
白石 瑞樹 SHIRAISHI, Mizuki; JP
菅原 琢人 SUGAWARA, Takuto; JP
西岡 宏司 NISHIOKA, Koji; JP
藤田 昌宏 FUJITA, Masahiro; JP
Agent:
中山 亨 NAKAYAMA, Tohru; JP
坂元 徹 SAKAMOTO, Toru; JP
Priority Data:
2016-02121205.02.2016JP
Title (EN) CYLINDRICAL TARGET PRODUCTION METHOD AND CYLINDRICAL TARGET
(FR) PROCÉDÉ DE PRODUCTION DE CIBLE CYLINDRIQUE ET CIBLE CYLINDRIQUE
(JA) 円筒型ターゲットの製造方法および円筒型ターゲット
Abstract:
(EN) [Problem] To provide a method for producing a cylindrical target substantially free from lengthwise distortion. [Solution] This cylindrical target production method comprises steps of: processing a target material into a cylindrical shape; forming an adapter for attachment to a sputtering device on the processed cylindrical target material; and measuring the straightness of the target material with the adapter in the lengthwise direction of the appearance to determine if the straightness of the target material with the adapter is within a preset range.
(FR) Cette invention concerne un procédé de production d'une cible cylindrique sensiblement exempte de distorsions dans le sens de la longueur. Ledit procédé de production de cible cylindrique comprend les étapes consistant à : traiter un matériau de cible en une forme cylindrique; former un adaptateur destiné à être fixé à un dispositif de pulvérisation sur le matériau de cible cylindrique traité; et mesurer la linéarité du matériau de cible par rapport à l'adaptateur dans la direction longitudinale de la forme pour déterminer si la rectitude du matériau de cible par rapport à l'adaptateur est dans une plage prédéterminée.
(JA) [課題]長さ方向にほぼ歪を有さない円筒型ターゲットを製造する方法を提供する。 [解決手段]本発明に係る円筒型ターゲットの製造方法は、ターゲット材料を円筒形状に加工する工程と、円筒形状に加工されたターゲット材料に、スパッタ装置に取り付けるためのアダプターを設ける工程と、アダプターを有するターゲット材料の真直度が、予め規定された範囲内であるか否かを確認するために、アダプターを有するターゲット材料の外観の長さ方向における真直度を測定する工程とを含む。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180103173CN108603282US20190041183KR1020190042103