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1. (WO2017132908) A SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING USING POSITIVE/NEGATIVE PHOTORESISTS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/132908 International Application No.: PCT/CN2016/073374
Publication Date: 10.08.2017 International Filing Date: 03.02.2016
IPC:
C23C 14/04 (2006.01) ,H01L 51/56 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara California, 95054, US
HUANG, Xi [CN/CN]; CN (KP)
Inventors:
HUANG, Xi; CN
LASSITER, Brian E.; US
BENCHER, Christopher Dennis; US
HAAS, Dieter; US
Agent:
LECOME INTELLECTUAL PROPERTY AGENT LTD.; Floor 16,Tower B of IN.DO Mansion No.48-Jia Zhichun Road Haidian District Beijing 100098, CN
Priority Data:
Title (EN) A SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING USING POSITIVE/NEGATIVE PHOTORESISTS
(FR) MASQUE PERFORÉ À OUVERTURES CONIQUES FORMÉ PAR DOUBLE ÉLECTROFORMAGE À L'AIDE DE PHOTORÉSINES POSITIVES/NÉGATIVES
Abstract:
(EN) Disclosed are methods and apparatus for a shadow mask. A shadow mask (200), comprising: a frame (210) made of a metallic material, and one or more mask patterns (205) coupled to the frame (210), the one or more mask patterns (205) comprising a metal having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings (215) formed therein, the metal having a thickness of about 5 microns to about 50 microns and having borders (355) formed therein each defining a fine opening (215) having a recessed surface (370) formed on a substrate contact surface (375) thereof.
(FR) L'invention concerne des procédés et un appareil destinés à un masque perforé. La présente invention concerne un masque perforé (200) qui comprend un cadre (210) constitué d'un matériau métallique, et un ou plusieurs motifs de masque (205) couplés au cadre (210), le ou les motifs de masque (205) comprenant un métal présentant un coefficient de dilatation thermique inférieur ou égal à environ 14 microns/mètre/degré Celsius et présentant une pluralité d'ouvertures (215) formées en leur sein, le métal ayant une épaisseur d'environ 5 microns à environ 50 microns et ayant des bordures (355) formées à l'intérieur et définissant chacune une ouverture fine (215) présentant une surface évidée (370) formée sur une surface de contact avec le substrat (375) de celle-ci.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020180105713CN108699671US20190036026