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1. (WO2017131378) CARBAZOLE DERIVATIVE, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAME, AND PHOTORESIST COMPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/131378 International Application No.: PCT/KR2017/000539
Publication Date: 03.08.2017 International Filing Date: 16.01.2017
IPC:
C07D 209/86 (2006.01) ,C07D 209/88 (2006.01) ,G03F 7/031 (2006.01) ,G03F 7/00 (2006.01) ,G02B 5/20 (2006.01) ,G02F 1/1335 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
209
Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
56
Ring systems containing three or more rings
80
[b, c]- or [b, d]-condensed
82
Carbazoles; Hydrogenated carbazoles
86
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
209
Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
56
Ring systems containing three or more rings
80
[b, c]- or [b, d]-condensed
82
Carbazoles; Hydrogenated carbazoles
88
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
031
Organic compounds not covered by group G03F7/02967
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
Applicants:
(주)켐이 CHEME INC. [KR/KR]; 대전시 유성구 테크노2로 199, 307호 #307, 199, Techno 2-ro Yuseong-gu Daejeon 34025, KR
Inventors:
김성현 KIM, Sung Hyun; KR
김상하 KIM, Sang Ha; KR
허윤희 HEO, Yoon Hee; KR
Agent:
특허법인 플러스 PLUS INTERNATIONAL IP LAW FIRM; 대전시 서구 한밭대로 809 10층 10F, 809, Hanbat-daero Seo-gu Daejeon 35209, KR
Priority Data:
10-2016-000991827.01.2016KR
Title (EN) CARBAZOLE DERIVATIVE, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAME, AND PHOTORESIST COMPOSITION
(FR) DÉRIVÉ DE CARBAZOLE, INITIATEUR DE PHOTOPOLYMÉRISATION COMPRENANT CELUI-CI, ET COMPOSITION DE RÉSINE PHOTOSENSIBLE
(KO) 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
Abstract:
(EN) The present invention relates to a novel carbazole derivative, a photopolymerization initiator comprising the same, and a photoresist composition. According to the present invention, the carbazole derivative simultaneously has an oxime ester group and a phosphonate group within one molecule such that ultraviolet rays can be effectively absorbed in comparison to a conventional photopolymerization initiator, and high sensitivity, heat resistance and chemical resistance can be implemented, and a photopolymerization initiator composition and a photoresist composition, which enable an excellent residual film rate, developability and strength to be implemented by comprising the carbazole derivative, are provided.
(FR) La présente invention concerne un nouveau dérivé de carbazole, un initiateur de photopolymérisation comprenant celui-ci, et une composition de résine photosensible. Selon la présente invention, le dérivé de carbazole comporte simultanément un groupe ester d'oxime et un groupe phosphonate dans une même molécule de sorte que les rayons ultraviolets puissent être efficacement absorbés par rapport à un initiateur de photopolymérisation conventionnel, et une sensibilité, une résistance à la chaleur et une résistance chimique élevées peuvent être mises en œuvre, et une composition d'initiateur de photopolymérisation et une composition de résine photosensible, qui permettent que d’excellents taux de film résiduel, développabilité et résistance soient mis en œuvre en incluant le dérivé de carbazole.
(KO) 본 발명은 신규한 카바졸 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물에 관한 것으로, 본 발명에 따른 카바졸 유도체는 한 분자내에 옥심 에스테르기와 포스포네이트기를 동시에 가짐으로써, 종래 광중합 개시제에 비하여 자외선을 효과적을 흡수할 수 있을 뿐 아니라 고 감도, 내열성 및 내화학성을 구현할 수 있으며, 이를 포함하여 우수한 잔막율, 현상성 및 강도(Strength)의 구현이 가능한 광중합 개시제 조성물 및 포토레지스트 조성물을 제공한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)