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1. (WO2017131198) LAMINATED FILM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/131198 International Application No.: PCT/JP2017/003047
Publication Date: 03.08.2017 International Filing Date: 27.01.2017
IPC:
B32B 9/00 (2006.01) ,C23C 14/08 (2006.01) ,H01L 31/048 (2014.01) ,H01L 51/50 (2006.01) ,H05B 33/02 (2006.01) ,H05B 33/04 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
04
adapted as conversion devices
042
including a panel or array of photoelectric cells, e.g. solar cells
048
encapsulated or with housing
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
04
Sealing arrangements
Applicants:
日東電工株式会社 NITTO DENKO CORPORATION [JP/JP]; 大阪府茨木市下穂積1丁目1番2号 1-1-2, Shimohozumi, Ibaraki-shi, Osaka 5678680, JP
Inventors:
宮本 幸大 MIYAMOTO Kodai; JP
梨木 智剛 NASHIKI Tomotake; JP
Agent:
籾井 孝文 MOMII Takafumi; JP
Priority Data:
2016-01652529.01.2016JP
Title (EN) LAMINATED FILM
(FR) FILM STRATIFIÉ
(JA) 積層フィルム
Abstract:
(EN) Provided is a laminated film that has an excellent moisture permeability and gas barrier properties, and has an excellent chemical resistance, transparency, flexibility, and heat resistance. A laminated film of the present invention has, in the following order: a substrate; a first oxide layer containing ZnO, Al, and SiO2; and a second oxide layer formed from SiO2. In an embodiment of the present invention, the thickness of the first oxide layer is 10nm-100nm, and the thickness of the second oxide layer is 10nm-100nm. In an embodiment of the present invention, the laminated film has a moisture permeability not exceeding 3.0×10-2g/m2/24hr and a total visible light transmittance of at least 84%.
(FR) L'invention concerne un film stratifié qui a une excellente perméabilité à l'humidité et d'excellentes propriétés de barrière de gaz, et a une excellente résistance chimique, transparence, flexibilité et résistance à la chaleur. Un film stratifié selon la présente invention comprend, dans l'ordre suivant : un substrat; une première couche d'oxyde contenant ZnO, Al et SiO2; et une seconde couche d'oxyde formée à partir de SiO2. Dans un mode de réalisation de la présente invention, l'épaisseur de la première couche d'oxyde est comprise entre 10 nm et 100 nm, et l'épaisseur de la seconde couche d'oxyde est comprise entre 10 nm et 100 nm. Dans un mode de réalisation de la présente invention, le film stratifié a une perméabilité à l'humidité ne dépassant pas 3,0×10-2g/m2/24h et un facteur de transmission de lumière visible d'au moins 84 %.
(JA) 優れた透湿性およびガスバリア性を有し、かつ、優れた耐薬品性、透明性、屈曲性および耐熱性を有する積層フィルムが提供される。本発明の積層フィルムは、基材と、ZnO、AlおよびSiOを含む第1の酸化物層と、SiOで構成された第2の酸化物層と、をこの順に有する。1つの実施形態においては、第1の酸化物層の厚みは10nm~100nmであり、第2の酸化物層の厚みは10nm~100nmである。1つの実施形態においては、積層フィルムは、透湿度が3.0×10-2g/m/24hr以下であり、可視光の全光線透過率が84%以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180111818CN108684200