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1. (WO2017131132) SAMPLE ANALYSIS DEVICE AND COLLECTOR MIRROR UNIT FOR SAMPLE ANALYSIS DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/131132 International Application No.: PCT/JP2017/002863
Publication Date: 03.08.2017 International Filing Date: 27.01.2017
IPC:
G01N 23/225 (2006.01) ,G01N 21/62 (2006.01) ,H01J 37/252 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
22
by measuring secondary emission
225
using electron or ion microprobe
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
62
Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
252
Tubes for spot-analysing by electron or ion beams; Microanalysers
Applicants:
株式会社堀場製作所 HORIBA, LTD. [JP/JP]; 京都府京都市南区吉祥院宮の東町2番地 2, Miyanohigashi-cho, Kisshoin, Minami-ku, Kyoto-shi, Kyoto 6018510, JP
Inventors:
粟田 正吾 AWATA, Shogo; JP
Agent:
西村 竜平 NISHIMURA, Ryuhei; JP
Priority Data:
2016-01491928.01.2016JP
Title (EN) SAMPLE ANALYSIS DEVICE AND COLLECTOR MIRROR UNIT FOR SAMPLE ANALYSIS DEVICE
(FR) DISPOSITIF D'ANALYSE D'ÉCHANTILLONS ET UNITÉ DE MIROIR COLLECTEUR POUR DISPOSITIF D'ANALYSE D'ÉCHANTILLONS
(JA) 試料分析装置及び試料分析装置用集光ミラーユニット
Abstract:
(EN) A sample analysis device for detecting light emitted from a measurement sample irradiated with charged particles and analyzing the measurement sample, wherein in order to enable an analysis at a higher resolution than in the past, the sample analysis device is provided with: an irradiation unit 3 for irradiating the sample W with charged particles; a collector mirror 41 provided between the irradiation unit 3 and the sample W, the collector mirror 41 collecting light emitted from the sample W; and a retarding voltage application unit 6 for applying a retarding voltage, for decelerating the charged particles, onto the sample W or a sample stand 201 on which the sample W is placed.
(FR) L'invention concerne un dispositif d'analyse d'échantillons pour détecter une lumière émise par un échantillon de mesure exposé avec des particules chargées et analyser l'échantillon de mesure, le dispositif d'analyse d'échantillons comprenant, afin de permettre une analyse à une résolution plus élevée que dans le passé : une unité d'exposition (3) pour exposer l'échantillon (W) avec des particules chargées ; un miroir collecteur (41) disposé entre l'unité d'exposition (3) et l'échantillon (W), le miroir collecteur (41) collectant une lumière émise par l'échantillon (W) ; et une unité d'application de tension de retard (6) pour appliquer une tension de retard, pour ralentir les particules chargées, sur l'échantillon (W) ou sur une platine d'échantillon (201) sur laquelle l'échantillon (W) est placé.
(JA) 荷電粒子が照射された測定試料から出る光を検出して前記測定試料を分析する試料分析装置において、従来よりも高い分解能で分析できるようにすべく、荷電粒子を試料Wに照射する照射部3と、照射部3と試料Wとの間に設けられるとともに、試料Wから出る光を集光する集光ミラー41と、試料W又は試料Wが載置される試料台201に荷電粒子を減速させるリターディング電圧を印加するリターディング電圧印加部6とを具備するようにした。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)