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1. (WO2017130746) EXPOSURE DEVICE AND EXPOSURE METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/130746 International Application No.: PCT/JP2017/001087
Publication Date: 03.08.2017 International Filing Date: 13.01.2017
IPC:
G03F 7/20 (2006.01) ,H05K 3/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
Applicants:
ウシオ電機株式会社 USHIO DENKI KABUSHIKI KAISHA [JP/JP]; 東京都千代田区丸の内一丁目6番5号 1-6-5, Marunouchi, Chiyoda-ku, Tokyo 1008150, JP
Inventors:
五十嵐 晃 IKARASHI Akira; JP
Agent:
保立 浩一 HOTATE Koichi; JP
Priority Data:
2016-01668729.01.2016JP
Title (EN) EXPOSURE DEVICE AND EXPOSURE METHOD
(FR) DISPOSITIF D'EXPOSITION ET PROCÉDÉ D'EXPOSITION
(JA) 露光装置及び露光方法
Abstract:
(EN) [Problem] To provide an exposure technique suitable for small-volume production of multiple products which is neither burdensome nor costly even when performing exposure with different exposure patterns for different types of products. [Solution] Alignment marks AM on a workpiece W are imaged with cameras 7 through a transmission-type digital photomask 2, and on the basis of the image data, a correction program on a controller 4 corrects the original pattern data. The correction includes correction of the display position of a master pattern and correction of magnification. Light from the light source 1, which includes ultraviolet rays, is irradiated through the corrected mask pattern onto the workpiece W, and the workpiece W is exposed.
(FR) La présente invention vise à fournir une technique d'exposition appropriée pour la production de faible volume de multiples produits qui n'est pas laborieuse ni coûteuse, même lors d'une exposition avec différents motifs d'exposition pour différents types de produits. À cet effet, l'invention concerne des repères d'alignement AM sur une pièce W qui sont imagés avec des caméras 7 à travers un photomasque numérique de type à transmission (2) et, sur la base des données d'image, un programme de correction sur une unité de commande (4) corrige les données de motif d'origine. La correction comprend la correction de la position d'affichage d'un motif principal et la correction d'agrandissement. La lumière provenant de la source de lumière (1), qui comprend des rayons ultraviolets, est irradiée à travers le motif de masque corrigé sur la pièce W, et la pièce W est exposée.
(JA) 【課題】 異なる品種用に異なる露光パターンでの露光を行う場合にも手間やコストがかからず、多品種少量生産に適した露光技術を提供する。 【解決手段】 ワークWの各アライメントマークAMが、透過型であるデジタルフォトマスク2を通して各カメラ7で撮影され、各撮像データに基づいてコントローラ4上の修正プログラムがオリジナルのパターンデータを修正する。修正には、マスクパターンの表示位置の修正、倍率の修正が含まれる。光源1からの紫外線を含む光は、修正されたマスクパターンを通してワークWに照射され、ワークWが露光される。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180109970CN108885404