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1. (WO2017130395) CONVEYANCE DEVICE AND WASHING DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/130395 International Application No.: PCT/JP2016/052756
Publication Date: 03.08.2017 International Filing Date: 29.01.2016
IPC:
H01L 21/304 (2006.01) ,B08B 3/02 (2006.01) ,H01L 21/677 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3
Cleaning by methods involving the use or presence of liquid or steam
02
Cleaning by the force of jets or sprays
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
堺ディスプレイプロダクト株式会社 SAKAI DISPLAY PRODUCTS CORPORATION [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumicho, Sakai-ku, Sakai-shi, Osaka 5908522, JP
Inventors:
仲谷 知眞 NAKATANI, Tomochika; JP
Agent:
河野 英仁 KOHNO, Hideto; JP
Priority Data:
Title (EN) CONVEYANCE DEVICE AND WASHING DEVICE
(FR) DISPOSITIF DE TRANSPORT ET DISPOSITIF DE LAVAGE
(JA) 搬送装置及び洗浄装置
Abstract:
(EN) Provided are a conveyance device and a washing device that, when washing a glass substrate while conveying the same at a slant, can prevent breaking of the glass substrate during conveyance. A conveyance device according to the present invention comprises a first frame, a second frame that is provided in a higher location that the first frame and is substantially parallel to the first frame, and conveyance rollers that are axle-suspended between the first frame and the second frame and are provided with grooves on a surface thereof, said surface being formed from an elastic material. A washing device according to the present invention comprises a conveyance device and a spray unit that is provided above the conveyance device and sprays washing water downward.
(FR) L'invention concerne un dispositif de transport et un dispositif de lavage qui, lors du lavage d'un substrat de verre tout en transportant celui en pente, peuvent empêcher la rupture du substrat de verre pendant le transport. Un dispositif de transport selon la présente invention comprend un premier cadre, un second cadre qui est disposé à un endroit plus élevé que le premier cadre et est sensiblement parallèle au premier cadre, et des rouleaux de transport qui sont suspendus sur essieu entre le premier cadre et le second cadre et sont dotés de rainures sur sa surface, ladite surface étant constitué d'un matériau élastique. Un dispositif de lavage selon la présente invention comprend un dispositif de transport et une unité de pulvérisation qui est disposée au-dessus du dispositif de transport et pulvérise l'eau de lavage vers le bas.
(JA)  ガラス基板を傾斜させて搬送しつつ洗浄するに際し、搬送時におけるガラス基板の割れを防止することができる搬送装置及び洗浄装置を提供する。 本開示の搬送装置は、第1のフレームと、第1のフレームよりも高い位置に第1のフレームと略平行をなして設けられた第2のフレームと、第1のフレーム及び第2のフレーム間に軸架され、弾性材料で形成された表面に溝を設けた搬送ローラとを備える。本開示の洗浄装置は、搬送装置と、搬送装置の上方に設けられており、洗浄水を下方へ向けて噴射する噴射部とを備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)