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1. (WO2017130365) OVERLAY ERROR MEASUREMENT DEVICE AND COMPUTER PROGRAM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/130365 International Application No.: PCT/JP2016/052560
Publication Date: 03.08.2017 International Filing Date: 29.01.2016
IPC:
H01L 21/66 (2006.01) ,G01B 15/00 (2006.01) ,H01J 37/22 (2006.01) ,H01L 21/027 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
15
Measuring arrangements characterised by the use of wave or particle radiation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
22
Optical or photographic arrangements associated with the tube
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
株式会社 日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
福永 文彦 FUKUNAGA Fumihiko; JP
Agent:
戸田 裕二 TODA Yuji; JP
Priority Data:
Title (EN) OVERLAY ERROR MEASUREMENT DEVICE AND COMPUTER PROGRAM
(FR) DISPOSITIF DE MESURE DE DÉSALIGNEMENT DES CHEVAUCHEMENT ET PROGRAMME INFORMATIQUE
(JA) オーバーレイ誤差計測装置、及びコンピュータープログラム
Abstract:
(EN) The purpose of the present invention is to provide an overlay error measurement device that is capable of accurately recognizing patterns and executing overlay error measurement, even when one pattern overlaps with another pattern in some areas but not in others. In order to do so, the present invention provides an overlap error measurement device provided with a calculating device for calculating overlay error. The overlap error measurement device is provided with an image designation device for designating a plurality of regions demarcated by luminance borders on an image. The calculating device recognizes, as a first pattern, a region in an image to be measured, corresponding to the plurality of regions demarcated by luminance borders, and uses the recognized first pattern to measure overlay error.
(FR) Le but de la présente invention est de pourvoir à un dispositif de mesure de désalignement de chevauchement qui permette de reconnaître des motifs avec précision et d'exécuter une mesure de désalignement des chevauchement, même lorsqu'un motif chevauche un autre motif dans certaines zones mais pas dans d'autres. Pour ce faire, la présente invention concerne un dispositif de mesure de désalignement de chevauchement pourvu d'un dispositif de calcul pour calculer un désalignement de chevauchement. Le dispositif de mesure de désalignement de chevauchement est pourvu d'un dispositif de désignation d'image pour désigner une pluralité de régions délimitées par des bordures de luminance sur une image. Le dispositif de calcul reconnaît, comme premier motif, une région dans une image à mesurer, correspondant à la pluralité de régions délimitées par des bordures de luminance, et utilise le premier motif reconnu pour mesurer le désalignement de chevauchement.
(JA) 本発明は、1のパターンに他のパターンと重なる部分とそうでない部分が混在していたとしても、正確にパターンの識別を行い、オーバーレイ誤差計測を実行するオーバーレイ誤差計測装置の提供を目的とする。そのために本発明ではオーバーレイ誤差を演算する演算装置を備えたオーバーレイ誤差計測装置であって、画像上の輝度境界によって区切られた複数の領域を指定する画像指定装置を備え、前記演算装置は、前記輝度境界によって区切られた複数の領域に対応する被計測画像の領域を、第1のパターンとして識別し、当該識別された第1のパターンを用いてオーバーレイ誤差測定を行うオーバーレイ誤差計測装置を提案する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180095635US20190017817