Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2017130363) CHARGED PARTICLE BEAM DEVICE AND OPTICAL AXIS ADJUSTMENT METHOD THEREFOR
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/130363 International Application No.: PCT/JP2016/052558
Publication Date: 03.08.2017 International Filing Date: 29.01.2016
IPC:
H01J 37/04 (2006.01) ,H01J 37/09 (2006.01) ,H01J 37/147 (2006.01) ,H01J 37/21 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
09
Diaphragms; Shields associated with electron- or ion-optical arrangements; Compensation of disturbing fields
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
147
Arrangements for directing or deflecting the discharge along a desired path
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
21
Means for adjusting the focus
Applicants:
株式会社 日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
藪 修平 YABU Shuhei; JP
Agent:
戸田 裕二 TODA Yuji; JP
Priority Data:
Title (EN) CHARGED PARTICLE BEAM DEVICE AND OPTICAL AXIS ADJUSTMENT METHOD THEREFOR
(FR) DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES ET SON PROCÉDÉ DE RÉGLAGE D'AXE OPTIQUE
(JA) 荷電粒子線装置およびその光軸調整方法
Abstract:
(EN) The objective of the present invention is to suppress a misalignment of an optical axis even when an optical condition has been changed. To this end, an embodiment of the present invention comprises: a charged particle source (1) emitting a charged particle beam (4) to be irradiated onto a sample (14); a focusing lens system containing at least one focusing lens (7, 8) whereby the charged particle beam (4) becomes focused at a predetermined reduction ratio; deflectors (5, 6) located between the charged particle source (1) and the most downstream focusing lens (8) among the focusing lens system, and causing the virtual position of the charged particle source (1) to be moved; and control means (20, 21, 22) controlling the deflectors (5, 6) and the focusing lens system. The control means (20, 21, 22) control the deflectors (5, 6) in such a manner that by changing the reduction ratio of the focusing lens system, the virtual position of the charged particle source (1) is moved to a position (36) at which a misalignment of the charged particle beam (4) central trajectory downstream from the focusing lens system is suppressed.
(FR) La présente invention vise à supprimer un défaut d'alignement d'un axe optique, même lorsqu'une condition optique a été modifiée. À cette fin, un mode de réalisation de la présente invention comprend : une source de particules chargées (1) émettant un faisceau de particules chargées (4) devant être rendu incident sur un échantillon (14) ; un système de lentille de focalisation contenant au moins une lentille de focalisation (7, 8), qui focalise le faisceau de particules chargées (4) à un rapport de réduction prédéterminé ; des déflecteurs (5, 6) situés entre la source de particules chargées (1) et la lentille de focalisation la plus en aval (8) dans le système de lentille de focalisation, et qui provoquent un déplacement de la position virtuelle de la source de particules chargées (1) ; et des moyens de commande (20, 21, 22) commandant les déflecteurs (5, 6) et le système de lentille de focalisation. Les moyens de commande (20, 21, 22) commandent les déflecteurs (5, 6) de manière que, par modification du rapport de réduction du système de lentille de focalisation, la position virtuelle de la source de particules chargées (1) soit déplacée jusqu'à une position (36) à laquelle un défaut d'alignement de la trajectoire centrale du faisceau de particules chargées (4) en aval du système de lentille de focalisation est supprimé.
(JA) 本発明は、光学条件を変更した場合でも、光軸ずれを抑制することを目的として、その一実施形態では、試料(14)に照射される荷電粒子線(4)を放出する荷電粒子源(1)と、荷電粒子線(4)を所定の縮小率で集束する集束レンズ(7,8)を少なくとも一つ含む集束レンズ系と、前記集束レンズ系のうち最も下流の集束レンズ(8)と荷電粒子源(1)との間に位置し、荷電粒子源(1)の仮想位置を移動させる偏向器(5,6)と、偏向器(5,6)および前記集束レンズ系を制御する制御手段(20,21,22)と、を有し、制御手段(20,21,22)は、前記集束レンズ系の縮小率の変化による、前記集束レンズ系の下流における荷電粒子線(4)の中心軌道のずれを抑制する位置(36)に、荷電粒子源(1)の仮想位置を移動させるように、偏向器(5,6)を制御する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
CN108463869US20180374673DE112016005577