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1. (WO2017129440) PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/129440 International Application No.: PCT/EP2017/050858
Publication Date: 03.08.2017 International Filing Date: 17.01.2017
IPC:
C07F 9/6568 (2006.01) ,C07F 15/06 (2006.01) ,C23C 16/18 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
9
Compounds containing elements of the 5th Group of the Periodic System
02
Phosphorus compounds
547
Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
6564
having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
6568
having phosphorus atoms as the only ring hetero atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
15
Compounds containing elements of the 8th Group of the Periodic System
06
Cobalt compounds
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
06
characterised by the deposition of metallic material
18
from metallo-organic compounds
Applicants:
BASF SE [DE/DE]; Carl-Bosch-Str. 38 67056 Ludwigshafen am Rhein, DE
Inventors:
ABELS, Falko; DE
LOEFFLER, Daniel; DE
WILMER, Hagen; DE
WOLF, Robert; DE
ROEDL, Christian; DE
BÜSCHELBERGER, Philipp; DE
Agent:
BASF IP ASSOCIATION; Basf SE ZRX - C6 67056 Ludwigshafen, DE
Priority Data:
16152937.527.01.2016EP
Title (EN) PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
(FR) PROCÉDÉ DE PRODUCTION DE FILMS MINCES INORGANIQUES
Abstract:
(EN) The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state Ln....M... Xm (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.
(FR) La présente invention concerne le domaine des procédés de production de films minces inorganiques sur des substrats, en particulier des procédés de dépôt de couches atomiques. En particulier, la présente invention concerne un procédé consistant à amener un composé de formule générale (I), Ln....M... Xm (I), à l'état gazeux ou d'aérosol, et à déposer ledit composé de formule générale (I) depuis l'état gazeux ou d'aérosol sur un substrat solide, formule dans laquelle M représente un métal, L représente un ligand relié par coordination à M et qui contient au moins une liaison multiple phosphore-carbone, L contenant un noyau hétérocyclique contenant du phosphore ou une triple liaison phosphore-carbone, X représente un ligand relié par coordination à M, n représente un nombre de 1 à 5 et m représente un nombre de 0 à 5.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN108495856KR1020180111865EP3408273US20190003049