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1. (WO2017110909) OXIDE-SINTERED-BODY SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/110909 International Application No.: PCT/JP2016/088182
Publication Date: 29.06.2017 International Filing Date: 21.12.2016
IPC:
C23C 14/34 (2006.01) ,C04B 35/01 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
Applicants:
株式会社アルバック ULVAC, INC. [JP/JP]; 神奈川県茅ヶ崎市萩園2500番地 2500 Hagisono, Chigasaki-shi, Kanagawa 2538543, JP
Inventors:
高橋 一寿 TAKAHASHI, Kazutoshi; JP
日高 浩二 HIDAKA, Koji; JP
川越 裕 KAWAGOE, Yuu; JP
武末 健太郎 TAKESUE, Kentarou; JP
和田 優 WADA, Masaru; JP
上野 充 UENO, Mitsuru; JP
清田 淳也 KIYOTA, Junya; JP
小林 大士 KOBAYASHI, Motoshi; JP
武井 応樹 TAKEI, Masaki; JP
Agent:
大森 純一 OMORI, Junichi; JP
Priority Data:
2015-25290225.12.2015JP
Title (EN) OXIDE-SINTERED-BODY SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
(FR) CIBLE DE PULVÉRISATION À CORPS FRITTÉ À BASE D'OXYDE ET SON PROCÉDÉ DE FABRICATION
(JA) 酸化物焼結体スパッタリングターゲット及びその製造方法
Abstract:
(EN) An oxide-sintered-body sputtering target according to an embodiment of the present invention is formed of a sintered body containing an indium oxide, a zinc oxide, a titanium oxide, and a zirconium oxide, wherein the atomic ratio of titanium with respect to the sum of the amounts of indium, zinc, and titanium is 0.1-20 %, and the specific weight of zirconium with respect to the sum of indium oxide, zinc oxide, titanium oxide, and zirconium oxide is 10-2000 ppm.
(FR) Selon un mode de réalisation, la présente invention concerne une cible de pulvérisation à corps fritté à base d'oxyde, constituée d'un corps fritté contenant un oxyde d'indium, un oxyde de zinc, un oxyde de titane et un oxyde de zirconium, le rapport atomique du titane par rapport à la somme des quantités de l'indium, du zinc et du titane allant 0,1 à 20 %, et le poids spécifique du zirconium par rapport à la somme de l'oxyde d'indium, de l'oxyde de zinc, de l'oxyde de titane et de l'oxyde de zirconium étant de 10 à 2000 ppm.
(JA) 本発明の一形態に係る酸化物焼結体スパッタリングターゲットは、酸化インジウムと、酸化亜鉛と、酸化チタンと、酸化ジルコニウムとを含む焼結体で構成され、インジウム、亜鉛およびチタンの総和に対するチタンの原子比は、0.1%以上20%以下であり、酸化インジウム、酸化亜鉛、酸化チタンおよび酸化ジルコニウムの総和に対するジルコニウムの重量比は、10ppm以上2000ppm以下である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180056746CN108350564US20180355472