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1. (WO2017110580) FUNCTIONAL FINE-WIRE PATTERN AND METHOD FOR MANUFACTURING FUNCTIONAL FINE-WIRE PATTERN
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/110580 International Application No.: PCT/JP2016/087037
Publication Date: 29.06.2017 International Filing Date: 13.12.2016
IPC:
B32B 3/12 (2006.01) ,B05D 3/02 (2006.01) ,B05D 5/00 (2006.01) ,H05K 1/02 (2006.01) ,H05K 3/10 (2006.01) ,H05K 3/24 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
3
Layered products essentially comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products essentially having particular features of form
10
characterised by a discontinuous layer, i.e. apertured or formed of separate pieces of material
12
characterised by a layer of regularly-arranged cells whether integral or formed individually or by conjunction of separate strips, e.g. honeycomb structure
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
3
Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
02
by baking
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
5
Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
1
Printed circuits
02
Details
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
10
in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
22
Secondary treatment of printed circuits
24
Reinforcing of the conductive pattern
Applicants:
コニカミノルタ株式会社 KONICA MINOLTA, INC. [JP/JP]; 東京都千代田区丸の内二丁目7番2号 2-7-2 Marunouchi, Chiyoda-ku, Tokyo 1007015, JP
Inventors:
新妻 直人 NIIZUMA Naoto; JP
大屋 秀信 OHYA Hidenobu; JP
山内 正好 YAMAUCHI Masayoshi; JP
小俣 猛憲 OMATA Takenori; JP
鈴木 圭一郎 SUZUKI Keiichiro; JP
Agent:
丸山 英一 MARUYAMA Eiichi; JP
Priority Data:
2015-25517125.12.2015JP
Title (EN) FUNCTIONAL FINE-WIRE PATTERN AND METHOD FOR MANUFACTURING FUNCTIONAL FINE-WIRE PATTERN
(FR) MOTIF À FIL FIN FONCTIONNEL ET SON PROCÉDÉ DE FABRICATION
(JA) 機能性細線パターン及び機能性細線パターンの製造方法
Abstract:
(EN) The present invention addresses the problem of providing a functional fine-wire pattern and a method for manufacturing a functional fine-wire pattern whereby low visibility of a pattern can be improved, and in order to solve the abovementioned problem, the present invention is configured from a plurality of pattern parts 3 in which a plurality of closed geometric-design fine wires 31 including a functional material are two-dimensionally arranged in rows so that adjacent geometric-design fine wires 31 are connected to each other at a plurality of intersection points on a substrate 1, and gap parts 4 provided between adjacent pattern parts 3, the gap parts 4 being provided so that the arrangement pitch of the geometric-design fine wires 31 is maintained across the plurality of pattern parts 3.
(FR) La présente invention aborde le problème de la réalisation d'un motif de fil fin fonctionnel et d'un procédé de fabrication d'un motif à fil fin fonctionnel par lequel la faible visibilité d'un motif peut être améliorée. Pour ce faire, la présente invention est constituée d'une pluralité de parties de motif (3) dans lesquelles une pluralité de fils fins de conception géométrique fermée (31) comprenant un matériau fonctionnel sont disposés en deux dimensions en rangées de sorte que les fils fins de conception géométrique (31) voisins sont reliés les uns aux autres au niveau d'une pluralité de points d'intersection sur un substrat (1), et des parties d'espacement (4) sont disposées entre les parties de motif (3) voisines, les parties d'espacement (4) étant réalisées de telle sorte que le pas d'agencement des fils fins de conception géométrique (31) est maintenu sur la pluralité de parties de motif (3).
(JA) 本発明は、パターンの低視認性を向上できる機能性細線パターン及び機能性細線パターンの製造方法を提供することを課題とし、基材1上に、機能性材料を含む閉じられた幾何学図形細線31を、隣り合う幾何学図形細線31同士が互いに複数の交点で接続されるように、二次元的に複数並設してなる複数のパターン部3と、隣り合うパターン部3間に設けられた間隙部4と、により構成され、幾何学図形細線31の配置ピッチを複数のパターン部3に渡って保持するように間隙部4が設けられていることで解決される。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)