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1. (WO2017099815) ROBOT END EFFECTOR APPLYING TENSILE HOLDING FORCE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/099815 International Application No.: PCT/US2016/000119
Publication Date: 15.06.2017 International Filing Date: 08.12.2016
IPC:
H01L 21/677 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
GENMARK AUTOMATION, INC. [US/US]; 46723 Lakeview Boulevard Fremont, CA 94538, US
Inventors:
TODOROV, Alexander; US
SOTIROV, Zlatko, Manolov; US
Agent:
SHAMI, Khaled; US
SHAMI, Khaled; US
Priority Data:
14/962,64708.12.2015US
Title (EN) ROBOT END EFFECTOR APPLYING TENSILE HOLDING FORCE
(FR) EFFECTEUR DE ROBOT APPLIQUANT UNE FORCE DE MAINTIEN DE TRACTION
Abstract:
(EN) In one embodiment, a substrate handling robot includes a robot body, a robot arm mounted to the robot body, and an end effector mounted to the robot arm. The end effector includes first and second fingers each having one or more pins protruding therefrom, and a first motor for axially rotating the first finger. At least one pin of the first finger and one pin of the second finger are configured to mate with corresponding holes in the substrate. Rotation of the first finger imparts a tensional force to the substrate, suitable for reducing sag in ultra-thin substrates on the order of 20 to 800 microns. In certain embodiments, both fingers are rotatable, synchronously or independently. In certain embodiments, rotation is replaced by translational or pivoting planar motions, also imparting tensional force to the substrate.
(FR) La présente invention concerne, dans un mode de réalisation, un robot de manutention de substrat qui comprend un corps de robot, un bras de robot monté sur le corps de robot et un effecteur monté sur le bras de robot. L'effecteur comprend des premier et second doigts ayant chacun une ou plusieurs broches faisant saillie à partir de ceux-ci et un premier moteur afin de faire tourner axialement le premier doigt. Au moins une broche du premier doigt et une broche du second doigt sont conçues pour s'accoupler avec des trous correspondants dans le substrat. La rotation du premier doigt exerce une force de tension sur le substrat, apte à réduire l'affaissement dans des substrats ultra-minces de l'ordre de 20 à 800 microns. Dans certains modes de réalisation, les deux doigts peuvent tourner, de manière synchrone ou indépendante. Dans certains modes de réalisation, la rotation est remplacée par des mouvements plans en translation ou en pivotement, conférant aussi une force de tension au substrat.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)