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1. (WO2017099239) GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/099239 International Application No.: PCT/JP2016/086801
Publication Date: 15.06.2017 International Filing Date: 09.12.2016
IPC:
B32B 9/00 (2006.01) ,C23C 16/42 (2006.01) ,C23C 16/56 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42
Silicides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
56
After-treatment
Applicants:
コニカミノルタ株式会社 KONICA MINOLTA, INC. [JP/JP]; 東京都千代田区丸の内二丁目7番2号 2-7-2 Marunouchi, Chiyoda-ku, Tokyo 1007015, JP
Inventors:
門馬 千明 MOMMA, Chiaki; JP
廣瀬 達也 HIROSE, Tatsuya; JP
Agent:
八田国際特許業務法人 HATTA & ASSOCIATES; 東京都千代田区二番町11番地9 ダイアパレス二番町 Dia Palace Nibancho, 11-9, Nibancho, Chiyoda-ku, Tokyo 1020084, JP
Priority Data:
2015-24245911.12.2015JP
Title (EN) GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
(FR) FILM DE BARRIÈRE VIS-À-VIS DES GAZ ET PROCÉDÉ POUR SA PRODUCTION
(JA) ガスバリア性フィルムおよびその製造方法
Abstract:
(EN) [Problem] To provide a means for improving the gas barrier properties, the heat and humidity resistance, and the processing suitability of a gas barrier film. [Solution] A gas barrier film obtained by positioning, in order, an underlayer and a gas barrier layer next to each other on at least one surface of a resin substrate, wherein, if the average composition of the gas barrier layer is represented by SiOxCy (where x and y are stoichiometric coefficients): y is set to 0.40 < y ≤ 0.95; the thickness of the gas barrier layer is set to 5–90 nm; the surface hardness (SH) of the film surface on the side where the gas barrier layer is positioned with respect to the underlayer is set to 1.4–3.5 GPa, as measured by nano-indentation; and the surface roughness (Ra) of the film surface on the side where the gas barrier film is positioned with respect to the underlayer is set to 1–18 nm.
(FR) L'invention vise à procurer des moyens pour améliorer les propriétés de barrière vis-à-vis des gaz, la résistance à la chaleur et à l'humidité, et l'aptitude au traitement d'un film de barrière vis-à-vis des gaz. A cet effet, l'invention porte sur un film de barrière vis-à-vis des gaz, lequel film est obtenu par la disposition, dans l'ordre, d'une sous-couche et d'une couche de barrière vis-à-vis des gaz l'une contre l'autre sur au moins une surface d'un substrat de résine, et dans lequel, si la composition moyenne de la couche de barrière vis-à-vis des gaz est représentée par SiOxCy (où x et y sont des coefficients stœchiométriques) : y est de 0,40 < y ≤ 0,95 ; l'épaisseur de la couche de barrière vis-à-vis des gaz est établie entre 5 et 90 nm ; la dureté de surface (SH) de la surface de film sur le côté où la couche de barrière vis-à-vis des gaz est positionnée par rapport à la sous-couche est établie entre 1,4 et 3,5 GPa, telle que mesurée par nano-indentation ; et la rugosité de surface (Ra) de la surface de film sur le côté où le film de barrière vis-à-vis des gaz est positionné par rapport à la sous-couche est établie entre 1 et 18 nm.
(JA) 【課題】ガスバリア性フィルムにおいて、ガスバリア性および湿熱耐性を向上させるとともに、工程適性をも向上させうる手段を提供する。 【解決手段】樹脂基材の少なくとも一方の面に、互いに隣接する下地層およびガスバリア層がこの順に配置されてなるガスバリア性フィルムにおいて、前記ガスバリア層の平均組成をSiO(xおよびyは化学量論係数)で表したときに、yを0.40<y≦0.95とし、前記ガスバリア層の厚さを5~90nmとし、ナノインデンテーション法により測定される、前記下地層に対して前記ガスバリア層が配置された側のフィルム表面における表面硬度(SH)を1.4~3.5GPaとし、かつ、前記下地層に対して前記ガスバリア層が配置された側のフィルム表面における表面粗さ(Ra)を1~18nmとする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)