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1. (WO2017099175) PLASMA REACTOR
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/099175 International Application No.: PCT/JP2016/086536
Publication Date: 15.06.2017 International Filing Date: 08.12.2016
IPC:
B01J 19/08 (2006.01) ,H05H 1/24 (2006.01) ,B01D 53/92 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19
Chemical, physical, or physico-chemical processes in general; Their relevant apparatus
08
Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
92
of engine exhaust gases
Applicants:
日本特殊陶業株式会社 NGK SPARK PLUG CO., LTD. [JP/JP]; 愛知県名古屋市瑞穂区高辻町14番18号 14-18, Takatsuji-cho, Mizuho-ku, Nagoya-shi, Aichi 4678525, JP
Inventors:
伊藤 伸介 ITOH Shinsuke; JP
灘浪 紀彦 NADANAMI Norihiko; JP
間所 和彦 MADOKORO Kazuhiko; JP
内藤 一哉 NAITO Kazuya; JP
上西 真里 UENISHI Mari; JP
田中 裕久 TANAKA Hirohisa; JP
Agent:
特許業務法人栄光特許事務所 EIKOH PATENT FIRM, P.C.; 東京都港区西新橋一丁目7番13号 虎ノ門イーストビルディング10階 Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2015-24043809.12.2015JP
Title (EN) PLASMA REACTOR
(FR) RÉACTEUR À PLASMA
(JA) プラズマリアクタ
Abstract:
(EN) This plasma reactor is provided with a plasma panel stack (20) and electrically conductive members (50, 51). A plasma panel stack (20) has a structure in which electrode panels (30) are stacked, and plasma is generated between adjacent electrode panels (30). The stacking direction of the electrode panels (30) is 90°±45° relative to the vertical direction. The electrically conductive members (50, 51) are connected to a discharge electrode of the electrode panels (30), and are disposed in the region at the upper half of the plasma panel stack (20).
(FR) Le réacteur à plasma de l’invention est équipé d’un corps stratifié d’écrans à plasma (20) et d’éléments de conduction électrique (50, 51). Ce corps stratifié d’écrans à plasma (20) possède une structure dans laquelle des panneaux d’électrode (30) sont stratifiés, et génèrent un plasma entre les panneaux d’électrode (30) adjacents. La direction de stratification des panneaux d’électrode (30), est de 90°±45° par rapport à la direction verticale. Les éléments de conduction électrique (50, 51) sont connectés à des électrodes de décharge des panneaux d’électrode (30), et sont disposés en une région de la moitié supérieure du corps stratifié d’écrans à plasma (20).
(JA) 本発明のプラズマリアクタは、プラズマパネル積層体(20)及び電気導通部材(50,51)を備える。プラズマパネル積層体(20)は、電極パネル(30)を積層した構造を有し、隣接する電極パネル(30)間でプラズマを発生する。電極パネル(30)の積層方向は、鉛直方向に対して90°±45°である。電気導通部材(50,51)は、電極パネル(30)の放電電極に接続しており、プラズマパネル積層体(20)の上半分の領域に配置される。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)