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1. (WO2017099130) NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/099130 International Application No.: PCT/JP2016/086401
Publication Date: 15.06.2017 International Filing Date: 07.12.2016
Chapter 2 Demand Filed: 31.05.2017
IPC:
C07C 271/24 (2006.01) ,C07C 271/12 (2006.01) ,C08F 2/50 (2006.01) ,C09D 7/12 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
271
Derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups
06
Esters of carbamic acids
08
having oxygen atoms of carbamate groups bound to acyclic carbon atoms
24
with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
271
Derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups
06
Esters of carbamic acids
08
having oxygen atoms of carbamate groups bound to acyclic carbon atoms
10
with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
12
to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
7
Features of coating compositions, not provided for in group C09D5/88
12
Other additives
Applicants:
学校法人東京理科大学 TOKYO UNIVERSITY OF SCIENCE FOUNDATION [JP/JP]; JP
日本化薬株式会社 NIPPONKAYAKU KABUSHIKIKAISHA [JP/JP]; 東京都千代田区丸の内2丁目1番1号 1-1, Marunouchi 2-chome, Chiyoda-ku Tokyo 1000005, JP
Inventors:
寺田 究 TERADA Kiwamu; JP
山本 和義 YAMAMOTO Kazuyoshi; JP
有光 晃二 ARIMITSU Koji; JP
Agent:
上村 陽一郎 KAMIMURA Yoichiro; JP
Priority Data:
2015-24043309.12.2015JP
2016-12609724.06.2016JP
Title (EN) NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
(FR) NOUVEAU COMPOSÉ, INITIATEUR DE PHOTOPOLYMÉRISATION COMPRENANT LEDIT COMPOSÉ, ET COMPOSITION DE RÉSINE PHOTOSENSIBLE CONTENANT LEDIT INITIATEUR DE PHOTOPOLYMÉRISATION
(JA) 新規化合物、該化合物を含んでなる光重合開始剤及び該光重合開始剤を含有する感光性樹脂組成物
Abstract:
(EN) The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1) (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
(FR) La présente invention concerne : un nouveau composé qui peut générer une base et un radical après irradiation par un rayonnement d'énergie active ; un initiateur de photopolymérisation qui comprend le nouveau composé ; et une composition de résine photosensible qui contient l'initiateur de photopolymérisation, présente une grande sensibilité et une excellente stabilité au stockage, et peut être transformée en un article durci qui ne présente pas de propriété corrosive métallique. Le nouveau composé est représenté par la formule (1) (R1 à R6 représentant indépendamment un atome d'hydrogène, un groupe hydroxy, un groupe alcoxy, un groupe organique autre que les substituants mentionnés, ou similaire ; X représente un résidu ayant une structure telle que n atomes d'hydrogène sont retirés d'un hydrocarbure saturé contenant une structure cyclique ; et n représente un entier de 1 à 6).
(JA) 活性エネルギー線の照射により塩基とラジカルを発生し得る新規化合物、該新規化合物を含んでなる光重合開始剤及び該光重合開始剤を含有し、高感度で保存安定性に優れ、かつ金属腐食性の無い硬化物の得られる感光性樹脂組成物を提供することであり、該新規化合物は、下記式(1)(式(1)中、R乃至Rはそれぞれ独立に、水素原子、水酸基、アルコキシ基又は前記の置換基以外の有機基等を表す。Xは環構造を含む飽和炭化水素からn個の水素原子を除いた残基を表す。nは1乃至6の整数を表す。)で表わされる化合物である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
CN108368036KR1020180091836DE112016005633US20180370908