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1. (WO2017098880) NOVOLAC RESIN AND RESIST FILM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/098880 International Application No.: PCT/JP2016/084055
Publication Date: 15.06.2017 International Filing Date: 17.11.2016
IPC:
C08G 8/28 (2006.01) ,C08L 61/12 (2006.01) ,G03F 7/039 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Condensation polymers of aldehydes or ketones with phenols only
28
Chemically modified polycondensates
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
61
Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
04
Condensation polymers of aldehydes or ketones with phenols only
06
of aldehydes with phenols
12
with polyhydric phenols
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants:
DIC株式会社 DIC CORPORATION [JP/JP]; 東京都板橋区坂下三丁目35番58号 35-58, Sakashita 3-chome, Itabashi-ku, Tokyo 1748520, JP
Inventors:
今田 知之 IMADA Tomoyuki; JP
佐藤 勇介 SATO Yusuke; JP
Agent:
河野 通洋 KONO Michihiro; JP
Priority Data:
2015-23853807.12.2015JP
Title (EN) NOVOLAC RESIN AND RESIST FILM
(FR) RÉSINE NOVOLAQUE ET FILM DE RÉSERVE
(JA) ノボラック型樹脂及びレジスト膜
Abstract:
(EN) Provided are a novolac resin having excellent development properties, heat resistance and dry-etching resistance, a light-sensitive composition containing same, a curable composition, and a resist film. The novolac resin is characterized by: having, as a repeating unit, a structural moiety indicated by structural formula (1) or (2) (in the formula, Ar indicates an arylene group. R1 each independently indicate a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom. m each independently indicate an integer of 1-3. X indicates a hydrogen atom, a tertiary alkyl group, an alkoxy alkyl group, an acyl group, an alkoxy carbonyl group, a heteroatom-containing cyclic hydrocarbon group, or a trialkyl silyl group); and at least one X present in the resin being a tertiary alkyl group, an alkoxy alkyl group, an acyl group, an alkoxy carbonyl group, a heteroatom-containing cyclic hydrocarbon group, or a trialkyl silyl group.
(FR) L'invention concerne une résine novolaque présentant d'excellentes propriétés de développement, résistance à la chaleur et résistance à la gravure sèche, une composition photosensible contenant cette dernière, une composition durcissable, et un film de réserve. La résine novolaque est caractérisée en ce qu'elle comprend, comme motif récurrent, une fraction structurale représentée par la formule structurale (1) ou (2) (dans la formule, Ar désigne un groupe arylène. R1 représentent chacun indépendamment un atome d'hydrogène, un groupe alkyle, un groupe alcoxy ou un atome d'halogène. m représentent chacun indépendamment un entier de 1 à 3. X représente un atome d'hydrogène, un groupe alkyle tertiaire, un groupe alcoxy alkyle, un groupe acyle, un groupe alcoxy carbonyle, un groupe hydrocarbure cyclique contenant des hétéroatomes, ou un groupe trialkylsilyle); et au moins un X présent dans la résine étant un groupe alkyle tertiaire, un groupe alcoxy alkyle, un groupe acyle, un groupe alcoxy carbonyle, un groupe hydrocarbure cyclique contenant des hétéroatomes, ou un groupe trialkylsilyle.
(JA) 現像性、耐熱性及びドライエッチング耐性に優れるノボラック型樹脂、これを含有する感光性組成物、硬化性組成物及びレジスト膜を提供すること。下記構造式(1)又は(2)[式中、Arはアリーレン基を表す。Rはそれぞれ独立に水素原子、アルキル基、アルコキシ基、ハロゲン原子の何れかであり、mはそれぞれ独立に1~3の整数である。Xは水素原子、3級アルキル基、アルコキシアルキル基、アシル基、アルコキシカルボニル基、ヘテロ原子含有環状炭化水素基、トリアルキルシリル基の何れかである。] で表される構造部位を繰り返し単位として有し、樹脂中に存在するXのうち少なくとも一つが3級アルキル基、アルコキシアルキル基、アシル基、アルコキシカルボニル基、ヘテロ原子含有環状炭化水素基、トリアルキルシリル基の何れかであることを特徴とするノボラック型樹脂。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
JPWO2017098880CN108368214KR1020180090789US20180334523