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1. (WO2017098667) TARGET GENERATION DEVICE AND EUV LIGHT GENERATION DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/098667 International Application No.: PCT/JP2015/084848
Publication Date: 15.06.2017 International Filing Date: 11.12.2015
IPC:
H05G 2/00 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants:
ギガフォトン株式会社 GIGAPHOTON INC. [JP/JP]; 栃木県小山市大字横倉新田400番地 400, Oaza Yokokurashinden, Oyama-shi, Tochigi 3238558, JP
Inventors:
石原 孝信 ISHIHARA Takanobu; JP
Agent:
森村靖男 MORIMURA Yasuo; JP
Priority Data:
Title (EN) TARGET GENERATION DEVICE AND EUV LIGHT GENERATION DEVICE
(FR) DISPOSITIF DE GÉNÉRATION DE CIBLE ET DISPOSITIF DE GÉNÉRATION DE LUMIÈRE EUV
(JA) ターゲット生成装置、及び、極端紫外光生成装置
Abstract:
(EN) This target generation device is equipped with: a nozzle 262 including a nozzle hole 263 for ejecting, inside a chamber, a target 27 comprising a molten metal; and a cylindrical member 410 mounted on the nozzle 262 in such a manner as to surround the nozzle hole 263, and having, exposed on at least a portion of the internal wall surface thereof, a substance whereof the standard free energy for generating an oxide is smaller than that of the molten metal.
(FR) La présente invention concerne un dispositif de génération de cible qui est équipé : d'une buse (262) comportant un trou de buse (263) destiné à éjecter, à l'intérieur d'une chambre, une cible (27) comprenant un métal fondu ; et d'un élément cylindrique (410) monté sur la buse (262) de manière à entourer le trou de buse (263) et ayant une substance, exposée sur au moins une partie de la surface de paroi interne de ce dernier, et dont l'énergie libre standard pour générer un oxyde est inférieure à celle du métal fondu.
(JA) ターゲット生成装置は、チャンバ内で溶融金属からなるターゲット27を吐出するノズル孔263を含むノズル262と、ノズル孔263を囲むようにノズル262に取り付けられ、内壁面の少なくとも一部に溶融金属よりも酸化物の標準生成自由エネルギーの小さな物質が露出する筒状部材410と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)