Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2017098651) MIST APPLYING FILM FORMING DEVICE AND MIST APPLYING FILM FORMING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/098651 International Application No.: PCT/JP2015/084771
Publication Date: 15.06.2017 International Filing Date: 11.12.2015
IPC:
B05B 17/06 (2006.01) ,B05B 7/26 (2006.01) ,B05C 9/14 (2006.01) ,B05D 1/02 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
B
SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
17
Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass
04
operating with special methods
06
using ultrasonic vibrations
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
B
SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
7
Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
24
with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
26
Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
9
Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by groups B05C1/-B05C7/159
08
for applying liquid or other fluent material and performing an auxiliary operation
14
the auxiliary operation involving heating
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Processes for applying liquids or other fluent materials
02
performed by spraying
Applicants:
東芝三菱電機産業システム株式会社 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION [JP/JP]; 東京都中央区京橋三丁目1番1号 3-1-1 Kyobashi, Chuo-ku, Tokyo 1040031, JP
Inventors:
李 天明 LI Tianming; JP
Agent:
吉竹 英俊 YOSHITAKE Hidetoshi; JP
Priority Data:
Title (EN) MIST APPLYING FILM FORMING DEVICE AND MIST APPLYING FILM FORMING METHOD
(FR) DISPOSITIF DE FORMATION DE FILM D'APPLICATION DE BROUILLARD ET PROCÉDÉ DE FORMATION DE FILM D'APPLICATION DE BROUILLARD
(JA) ミスト塗布成膜装置及びミスト塗布成膜方法
Abstract:
(EN) The purpose of the present invention is to provide a mist applying film forming device and mist applying film forming method that can form a uniform thin-film with a film thickness of 100 nm or less. In the present invention, an application fluid atomization mechanism (50) implements an application fluid mist generating process for generating an application fluid mist (6) by atomizing an application fluid 5 using an ultrasonic transducer (1) for generating ultrasonic waves. A mist application mechanism (70) implements an application fluid mist application process for applying the application fluid mist (6) on the surface of a substrate (9) by supplying application fluid mist (6) from a mist application head (8) onto the surface of the substrate (9) mounted on a moving stage (10). A baking and drying mechanism (90) implements baking and drying processes for forming the thin film on the surface of the substrate (9) by baking and drying the substrate (9) to which the application fluid mist (6) has been applied on the surface on a hot plate (13) and by evaporating a solvent in the liquid film formed by the application fluid mist (6).
(FR) La présente invention concerne un dispositif de formation de film d'application de brouillard et un procédé de formation de film d'application de brouillard qui peuvent former un film mince uniforme ayant une épaisseur de film de 100 nm ou moins. Dans la présente invention, un mécanisme d'atomisation de fluide d'application (50) met en œuvre un processus de production de brouillard de fluide d'application pour la production d'un brouillard de fluide d'application (6) par atomisation d'un fluide d'application à l'aide d'un transducteur ultrasonore (1) pour la production d'ondes ultrasonores. Un mécanisme d'application de brouillard (70) met en œuvre un processus d'application de brouillard de fluide d'application pour l'application du brouillard de fluide d'application (6) sur la surface d'un substrat (9) par fourniture d'un brouillard de fluide d'application (6) provenant d'une tête d'application de brouillard (8) sur la surface de substrat (9) monté sur une platine mobile (10). Un mécanisme de cuisson et de séchage (90) met en œuvre des processus de cuisson et de séchage pour la formation du film mince sur la surface du substrat (9) par cuisson et séchage du substrat (9) sur lequel le brouillard de fluide d'application (6) a été appliqué sur la surface sur une plaque chaude (13) et par évaporation d'un solvant dans le film liquide formé par le brouillard de fluide d'application (6).
(JA) 本発明は、膜厚が100nm以下の薄膜を、均一に成膜できるミスト塗布成膜装置及びミスト塗布成膜方法を提供することを目的とする。そして、本発明において、塗布液霧化機構(50)は、超音波を発生する超音波振動子(1)を利用して塗布液5を霧化して塗布液ミスト(6)を発生する塗布液ミスト発生処理を実行する。ミスト塗布機構(70)は、ミスト塗布ヘッド(8)から移動ステージ(10)上に載置された基板(9)の表面上に塗布液ミスト(6)を供給して、基板(9)の表面上に塗布液ミスト(6)を塗布する塗布液ミスト塗布処理を実行する。焼成・乾燥機構(90)はホットプレート(13)上に塗布液ミスト(6)が表面上に塗布された基板(9)を焼成・乾燥し、塗布液ミスト(6)から形成された液膜の溶媒を蒸発させて基板(9)の表面上に薄膜を成膜する焼成・乾燥処理を実行する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180080295CN108472676US20180326436