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1. (WO2017097502) SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/097502 International Application No.: PCT/EP2016/076352
Publication Date: 15.06.2017 International Filing Date: 02.11.2016
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VAN SOMMEREN, Daan, Daniel, Johannes, Antonius; NL
BALTIS, Coen, Hubertus, Matheus; NL
BUDDENBERG, Harold, Sebastiaan; NL
GATTOBIGIO, Giovanni, Luca; NL
MELMAN, Johannes, Cornelis, Paulus; NL
NAKIBOGLU, Günes; NL
POLET, Theodorus, Wilhelmus; NL
STALS, Walter, Theodorus, Matheus; NL
VAN DE VIJVER, Yuri, Johannes, Gabriël; NL
VAN LIESHOUT, Josephus, Peter; NL
VIEYRA SALAS, Jorge, Alberto; NL
ZDRAVKOV, Aleksandar, Nikolov; NL
Agent:
DUNG, S.; NL
Priority Data:
15198441.608.12.2015EP
Title (EN) SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS
(FR) TABLE DE SUBSTRAT, APPAREIL LITHOGRAPHIQUE, ET PROCÉDÉ DE FONCTIONNEMENT D'APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface (60); wherein at least a portion (61) of the upper surface is configured so as to alter the stability of a meniscus (17) of immersion liquid when moving along the upper surface towards the substrate.
(FR) L'invention concerne une table de substrat (WT) configurée pour soutenir un substrat (W) pour une exposition dans un appareil lithographique à immersion, la table de substrat comprenant : un corps de support (30) ayant une surface de support (31) configurée pour soutenir le substrat ; et une bague de couvercle (130) fixe par rapport au corps de support et configurée pour entourer, dans une vue en plan, le substrat soutenu sur la surface de support, la bague de couvercle ayant une surface supérieure (60) ; au moins une partie (61) de la surface supérieure étant configurée pour modifier la stabilité d'un ménisque (17) de liquide d'immersion lors d'un déplacement le long de la surface supérieure vers le substrat.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN108604067EP3387491US20180364584