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1. (WO2017096647) PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING COLOR FILTER
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/096647 International Application No.: PCT/CN2015/098863
Publication Date: 15.06.2017 International Filing Date: 25.12.2015
IPC:
G03F 7/004 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
深圳市华星光电技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区塘明大道9-2号 NO.9-2, Tangming Road, Guangming District of Shenzhen, Guangdong 518132, CN
Inventors:
张岳妍 ZHANG, Yueyan; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E Shenkan Building, No.1043 Shangbu Zhong Road Shenzhen, Guangdong 518028, CN
Priority Data:
201510896311.508.12.2015CN
Title (EN) PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING COLOR FILTER
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE ET PROCÉDÉ DE FABRICATION D'UN FILTRE COLORÉ
(ZH) 光刻胶组合物及彩色滤光片的制作方法
Abstract:
(EN) A photoresist composition and a method for manufacturing a color filter. The photoresist composition comprises a first solvent (21), a second solvent (22), a photoinitiator (10), a monomer, a polymer, an additive, and dye. After the photoresist composition is heated, the first solvent (21) and the second solvent (22) therein are subjected to phase separation; after the phase separation, the first solvent (21) is located above the second solvent (22); the solubility of at least one of the photoinitiator (10), the monomer, the polymer, and the additive in the second solvent (22) is higher than the solubility thereof in the first solvent (21). Therefore, the photoresist composition can be used for solving the problem of wrinkles formed in the process of manufacturing a color filter due to the fact that upper and lower layers of the photoresist are uneven in curing degree.
(FR) L'invention concerne une composition de résine photosensible et un procédé de fabrication d'un filtre coloré. La composition de résine photosensible comprend un premier solvant (21), un deuxième solvant (22), un photoinitiateur (10), un monomère, un polymère, un additif, et un colorant. Après avoir chauffé la composition de résine photosensible, le premier solvant (21) et le deuxième solvant (22) dans celle-ci sont soumis à une séparation des phases ; après la séparation de phases, le premier solvant (21) se trouve au-dessus du deuxième solvant (22) ; la solubilité d'au moins l'un des éléments photoinitiateur (10), monomère, polymère et additif dans le deuxième solvant (22) est supérieure à la solubilité de ce même élément dans le premier solvant (21). Par conséquent, la composition de résine photosensible peut être utilisée pour résoudre le problème de plis formés lors du processus de fabrication d'un filtre coloré en raison du fait que les couches supérieure et inférieure de la résine photosensible présentent des degrés de durcissement irréguliers.
(ZH) 一种光刻胶组合物及彩色滤光片的制作方法。光刻胶组合物包括第一溶剂(21)、第二溶剂(22)、光起始剂(10)、单体、多聚物、添加剂、及染料,在加热后,其中的第一溶剂(21)与第二溶剂(22)会发生相分离,相分离后,所述第一溶剂(21)位于第二溶剂(22)的上层,所述光起始剂(10)、单体、多聚物、添加剂中至少一种在所述第二溶剂(22)中的溶解度高于在所述第一溶剂(21)中的溶解度,从而能够用于改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶皱问题。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)
Also published as:
US20170227845