Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2017095189) METHOD FOR FORMING ALUMINUM THIN FILM , AND ALUMINUM THIN FILM THEREBY
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/095189 International Application No.: PCT/KR2016/014122
Publication Date: 08.06.2017 International Filing Date: 02.12.2016
IPC:
C23C 4/00 (2016.01) ,C23C 4/06 (2016.01) ,C23C 4/12 (2016.01) ,C23C 4/123 (2016.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4
Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4
Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
04
characterised by the coating material
06
Metallic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4
Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
12
characterised by the method of spraying
[IPC code unknown for C23C 4/123]
Applicants:
웰머 주식회사 WELLMER CO., LTD. [KR/KR]; 경기도 화성시 동탄면 동탄산단2길 7-8 2층 2nd Floor, 7-8, Dongtansandan 2-gil, Dongtan-myeon, Hwaseong-si, Gyeonggi-do 18487, KR
Inventors:
엄태성 EOM, Tae Sung; KR
정선섭 JOUNG, Sun Sub; KR
Agent:
서만규 SUH, Man Kyu; KR
서경민 SUH, Kyung Min; KR
Priority Data:
10-2015-017064802.12.2015KR
10-2016-016337102.12.2016KR
Title (EN) METHOD FOR FORMING ALUMINUM THIN FILM , AND ALUMINUM THIN FILM THEREBY
(FR) PROCÉDÉ DE FORMATION DE FILM MINCE EN ALUMINIUM ET FILM MINCE EN ALUMINIUM AINSI FORMÉ
(KO) 알루미늄 박막의 형성 방법 및 이에 따른 알루미늄 박막
Abstract:
(EN) One embodiment of the present invention relates to a method for forming an aluminum thin film , and an aluminum thin film thereby . The technical purpose of the present invention is to provide a method for forming an aluminum thin film and an aluminum thin film, the method being capable of forming an aluminum thin film on a substrate made of various materials using a room temperature vacuum spray coating technique, and of implementing the original characteristics of the aluminum thin film beyond the limit of the substrate. To this end, disclosed are a method for forming an aluminum thin film and an aluminum thin film thereby, the method comprising the steps of: receiving a transfer gas from a transfer gas supply unit, receiving aluminum powder from a powder supply unit, and transferring the aluminum powder in an aerosol state; and colliding the aluminum powder transferred in the aerosol state with a substrate within a process chamber to crush the aluminum powder , thereby forming an aluminum thin film on the substrate.
(FR) Un mode de réalisation de la présente invention concerne un procédé de formation d'un film mince en aluminium, et un film mince en aluminium ainsi formé. Le but technique de la présente invention est de fournir un procédé de formation d'un film mince en aluminium et un film mince en aluminium, le procédé étant apte à former un film mince en aluminium sur des substrats constitués de matériaux divers par une technique de revêtement par pulvérisation sous vide à température ambiante, et à mettre en œuvre les caractéristiques originales du film mince en aluminium au-delà des limites du substrat. À cet effet, l'invention propose un procédé de formation d'un film mince en aluminium et un film mince en aluminium ainsi formé, le procédé comprenant les étapes consistant à : recevoir un gaz de transfert depuis une unité d'alimentation en gaz de transfert, recevoir une poudre d'aluminium depuis une unité d'alimentation de poudre et transférer la poudre d'aluminium dans un état d'aérosol ; et faire entrer en collision la poudre d'aluminium transférée à l'état d'aérosol avec un substrat dans une chambre de traitement afin d'écraser la poudre d'aluminium, ce qui permet de former un film mince en aluminium sur le substrat.
(KO) 본 발명의 일 실시예는 알루미늄 박막의 형성 방법 및 이에 따른 알루미늄 박막에 관한 것으로, 해결하고자 하는 기술적 과제는 상온 진공 분사 코팅 기술을 이용하여 다양한 재질의 기판 위에 알루미늄 박막을 형성할 수 있고, 기판의 한계를 넘어 알루미늄 박막의 본래 특성을 구현할 수 있는 알루미늄 박막의 형성 방법 및 알루미늄 박막을 제공하는데 있다. 이를 위해 본 발명은 이송 가스 공급부로부터 이송 가스를 공급받고, 분말 공급부로부터 알루미늄 분말을 공급받아, 상기 알루미늄 분말을 에어로졸 상태로 이송하는 단계; 및 상기 에어로졸 상태로 이송된 알루미늄 분말을 공정 챔버 내의 기재에 충돌 및 파쇄시켜, 상기 기재에 알루미늄 박막을 형성하는 단계로 이루어진 알루미늄 박막의 형성 방법 및 이에 따른 알루미늄 박막을 개시한다.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)