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1. (WO2017094592) POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/094592 International Application No.: PCT/JP2016/084837
Publication Date: 08.06.2017 International Filing Date: 24.11.2016
IPC:
G11B 5/84 (2006.01)
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
Applicants:
花王株式会社 KAO CORPORATION [JP/JP]; 東京都中央区日本橋茅場町一丁目14番10号 14-10, Nihonbashi Kayabacho 1-chome, Chuo-ku, Tokyo 1038210, JP
Inventors:
多久島大樹 TAKUSHIMA Daiki; --
山口哲史 YAMAGUCHI Norihito; --
木村陽介 KIMURA Yosuke; --
Agent:
特許業務法人池内・佐藤アンドパートナーズ IKEUCHI SATO & PARTNER PATENT ATTORNEYS; 大阪府大阪市北区天満橋1丁目8番30号OAPタワー26階 26th Floor, OAP TOWER, 8-30, Tenmabashi 1-chome, Kita-ku, Osaka-shi, Osaka 5306026, JP
Priority Data:
2015-23352530.11.2015JP
Title (EN) POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE
(FR) COMPOSITION DE LIQUIDE DE POLISSAGE POUR SUBSTRAT DE DISQUE MAGNÉTIQUE
(JA) 磁気ディスク基板用研磨液組成物
Abstract:
(EN) Provided is a polishing liquid composition for a magnetic disk substrate, the polishing liquid composition being capable of reducing post-polishing long wavelength waviness without significantly impairing polishing speed in rough polishing. The present invention pertains to a polishing liquid composition for a magnetic disk substrate, the polishing liquid composition containing non-spherical silica particles A, spherical silica particles B, and water, and having a pH value of 0.5-6.0, wherein the average minor diameter of the non-spherical silica particles A is greater than or equal to 105 mm and greater than the average minor diameter of the spherical silica particles B.
(FR) La présente invention concerne une composition de liquide de polissage pour un substrat de disque magnétique, la composition de liquide de polissage étant susceptible de réduire l'ondulation de grande longueur d'onde après polissage sans affecter sensiblement la vitesse de polissage en polissage grossier. La présente invention concerne une composition de liquide de polissage pour un substrat de disque magnétique, la composition de liquide de polissage contenant des particules de silice non-sphériques A, des particules de silice sphériques B et de l'eau, et ayant une valeur de pH de 0,5 à 6,0, le diamètre mineur moyen des particules de silice non-sphériques A étant supérieur ou égal à 105 mm et supérieur au diamètre mineur moyen des particules de silice sphériques B.
(JA) 粗研磨における研磨速度を大きく損ねることなく、研磨後の長波長うねりを低減できる磁気ディスク基板用研磨液組成物を提供する。非球状シリカ粒子A、球状シリカ粒子B及び水を含み、pHが、0.5以上6.0以下であり、前記非球状シリカ粒子Aの平均短径は、105nm以上であり、かつ、前記球状シリカ粒子Bの平均短径より大きい、磁気ディスク基板用研磨液組成物に関する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
MYPI 2018702067JPWO2017094592