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1. (WO2017093382) METHOD FOR GALVANIC METAL DEPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/093382 International Application No.: PCT/EP2016/079395
Publication Date: 08.06.2017 International Filing Date: 01.12.2016
IPC:
C25D 5/08 (2006.01) ,C25D 17/00 (2006.01) ,C25D 17/06 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
5
Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
08
Electroplating with moving electrolyte, e.g. jet electroplating
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
17
Constructional parts, or assemblies thereof, of cells for electrolytic coating
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
17
Constructional parts, or assemblies thereof, of cells for electrolytic coating
06
Suspending or supporting devices for articles to be coated
Applicants:
ATOTECH DEUTSCHLAND GMBH [DE/DE]; Erasmusstraße 20 10553 Berlin, DE
Inventors:
WEINHOLD, Ray; DE
KIRBACH, Uwe; DE
Agent:
SCHULZ, Hendrik; DE
Priority Data:
15197885.503.12.2015EP
Title (EN) METHOD FOR GALVANIC METAL DEPOSITION
(FR) PROCÉDÉ DE DÉPÔT GALVANIQUE DE MÉTAL
Abstract:
(EN) This invention concerns a method for galvanic metal deposition of a substrate using an anode and an electrolyte, wherein from each of a plurality of electrolyte nozzles a locally confined electrolyte stream is directed towards a part of a substrate surface which is to be treated, wherein a relative movement is carried out between the substrate and the electrolyte stream during deposition, characterized in that a first movement is carried out along a first path, wherein at least along a part of the first path a second movement is carried out along a second path, wherein the first and the second movement each are relative movements between the electrolyte stream and the substrate. Further, the invention concerns a substrate holder reception apparatus and an electrochemical treatment apparatus.
(FR) La présente invention concerne un procédé de dépôt galvanique de métal d'un substrat à l'aide d'une anode et d'un électrolyte, à partir de chaque buse d'une pluralité de buses à électrolyte, un courant d'électrolyte confiné localement étant dirigé vers une partie d'une surface de substrat à traiter, un mouvement relatif étant réalisé entre le substrat et le courant d'électrolyte pendant le dépôt, caractérisé en ce qu'un premier mouvement est réalisé selon une première trajectoire, au moins le long d'une partie de la première trajectoire, un second mouvement étant réalisé le long d'un second trajet, les premier et second mouvements étant chacun des mouvements relatifs entre le courant d'électrolyte et le substrat. L'invention concerne en outre un porte-substrat, un appareil de réception et un appareil de traitement électrochimique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN108138347KR1020180086243US20180265999EP3384071