Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2017092995) OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM OR OF A WAFER INSPECTION SYSTEM
Notifications of changes after publication
Publication DatePublication KindPublication Reason
08.06.2017A1Initial Publication with ISR
05.07.2018A8Correction of entry in Section I of the PCT Gazette
Under (71), applicant corrected to CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2, 73447 Oberkochen (DE) (for all designated states).