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1. (WO2017092091) QUANTUM DOT COLOR FILTER SUBSTRATE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/092091 International Application No.: PCT/CN2015/098471
Publication Date: 08.06.2017 International Filing Date: 23.12.2015
IPC:
G02F 1/1335 (2006.01) ,G02F 1/13357 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
[IPC code unknown for ERROR IPC Code incorrect: invalid subgroup (0=>999999)!]
Applicants:
深圳市华星光电技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. [CN/CN]; 中国广东省深圳市 光明新区塘明大道9-2号 NO.9-2, Tangming Road Guangming District of Shenzhen Guangdong 518132, CN
Inventors:
刘国和 LIU, Guohe; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E Shenkan Building, No.1043 Shangbu Zhong Road Shenzhen, Guangdong 518028, CN
Priority Data:
201510860705.530.11.2015CN
Title (EN) QUANTUM DOT COLOR FILTER SUBSTRATE MANUFACTURING METHOD
(FR) PROCÉDÉ DE FABRICATION DE SUBSTRAT DE FILTRE COLORÉ À POINTS QUANTIQUES
(ZH) 量子点彩膜基板的制作方法
Abstract:
(EN) A quantum dot color filter substrate manufacturing method forms a highly precise quantum dot pattern by using a characteristic that a wettability varying layer (14) comprising a photocatalyst has an improved wettability after being irradiated by ultraviolet light. The invention simplifies a process of manufacturing a quantum dot pattern while improving precision of the quantum dot pattern, provides a simple manufacturing process, reduces waste of a quantum dot material, and saves costs. A quantum dot color filter substrate manufactured by using the above method can effectively improve color saturation and a color gamut of a display device, thereby enhancing color performance of a display panel.
(FR) La présente invention concerne un procédé de fabrication de substrat de filtre coloré à points quantiques qui forme un motif de points quantiques très précis en utilisant une caractéristique qui est une couche de variation de mouillabilité (14) comprenant un photocatalyseur qui présente une mouillabilité améliorée après avoir été irradiée par une lumière ultraviolette. L’invention simplifie un procédé de fabrication d’un motif de points quantiques tout en améliorant la précision du motif de points quantiques, fournit un procédé de fabrication simple, réduit les déchets de matériau à points quantiques et réduit les coûts. Un substrat de filtre coloré à points quantiques fabriqué au moyen du procédé de l’invention peut améliorer efficacement la saturation de couleurs et la gamme de couleurs d’un dispositif d’affichage, de manière à augmenter les performances de couleur d’un panneau d’affichage.
(ZH) 一种量子点彩膜基板的制作方法,借由含光催化剂的润湿性变化层(14)经紫外光照射后其润湿性会变好的特点,形成高精细的量子点图形,简化量子点图形制作工艺的同时提升了量子点图形的精度,制作工艺简单,且减少了量子点材料的浪费,节约成本,所制得的量子点彩膜基板可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)
Also published as:
US20180031911