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1. (WO2017090186) SUBSTRATE PROCESSING DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/090186 International Application No.: PCT/JP2015/083408
Publication Date: 01.06.2017 International Filing Date: 27.11.2015
IPC:
H01L 21/677 (2006.01) ,B65G 1/00 (2006.01) ,H01L 21/673 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
B PERFORMING OPERATIONS; TRANSPORTING
65
CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
G
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
1
Storing articles, individually or in orderly arrangement, in warehouses or magazines
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
673
using specially adapted carriers
Applicants:
株式会社日立国際電気 HITACHI KOKUSAI ELECTRIC INC. [JP/JP]; 東京都港区西新橋二丁目15番12号 15-12, Nishi-shimbashi 2-chome, Minato-ku, Tokyo 1058039, JP
Inventors:
林 昭成 HAYASHI, Akinari; JP
Priority Data:
Title (EN) SUBSTRATE PROCESSING DEVICE
(FR) DISPOSITIF DE TRAITEMENT DE SUBSTRAT
(JA) 基板処理装置
Abstract:
(EN) Provided is a configuration that is equipped with: a plurality of placing units on which substrate containers are to be placed; a drive unit for driving the placing units; a transfer mechanism which carries the substrate containers to the placing units, and carries the substrate containers from the placing units; and a control unit that controls the drive unit and the transfer mechanism such that the substrate containers are received by a supporting unit of the transfer mechanism from the placing units, or the substrate containers are received by the placing units from the supporting unit of the transfer mechanism by raising and lowering the supporting unit of the transfer mechanism without moving the supporting unit of the transfer mechanism from an initial position.
(FR) L'invention porte sur une configuration qui est équipée : d'une pluralité d'unités de placement sur lesquelles sont disposés des récipients de substrats ; une unité d'entraînement pour entraîner les unités de placement ; un mécanisme de transfert qui transporte les récipients de substrats vers les unités de placement et transporte les récipients de substrats à partir des unités de placement ; et une unité de commande qui commande l'unité d'entraînement et le mécanisme de transfert de telle sorte que les récipients de substrats soient reçus par une unité de support du mécanisme de transfert en provenance des unités de placement, ou que les récipients de substrats soient reçus par les unités de placement de l'unité de support en provenance du mécanisme de transfert par élévation et abaissement de l'unité de support du mécanisme de transfert sans déplacer l'unité de support du mécanisme de transfert par rapport à une position initiale.
(JA) 基板収容器が載置される複数の載置部と、前記載置部を駆動する駆動部と、前記基板収容器の前記載置部への搬入と前記基板収容器の前記載置部からの搬出とを行う搬送機構と、前記搬送機構の支持部を初期位置から動かすことなく前記搬送機構の支持部を昇降させ、前記基板収容器を前記載置部から前記搬送機構の支持部に受渡、または、前記基板収容器を前記搬送機構の支持部から前記載置部に受渡するように前記駆動部と前記搬送機構を制御する制御部と、を備える構成が提供される。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020180066232CN108369919