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1. (WO2017090126) EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2017/090126 International Application No.: PCT/JP2015/083074
Publication Date: 01.06.2017 International Filing Date: 25.11.2015
IPC:
G03F 7/20 (2006.01) ,H05G 2/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants:
ギガフォトン株式会社 GIGAPHOTON INC. [JP/JP]; 栃木県小山市大字横倉新田400番地 400,Oaza Yokokurashinden,Oyama-shi, Tochigi 3238558, JP
Inventors:
植野 能史 UENO Yoshifumi; JP
Agent:
柳田 征史 YANAGIDA Masashi; 神奈川県横浜市港北区新横浜3-18-3 新横浜KSビル 7階 柳田国際特許事務所 YANAGIDA & Associates, 7F, Shin-Yokohama KS Bldg., 3-18-3, Shin-Yokohama, Kohoku-ku, Yokohama-shi, Kanagawa 2220033, JP
Priority Data:
Title (EN) EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE
(FR) DISPOSITIF DE GÉNÉRATION DE LUMIÈRE ULTRAVIOLETTE EXTRÊME
(JA) 極端紫外光生成装置
Abstract:
(EN) This extreme ultraviolet light generating device is provided with a focusing mirror that reflects and focuses extreme ultraviolet light and a magnet that generates a magnetic field. The focusing mirror may include a first mirror section, which includes a first reflection surface formed by part of a spheroidal surface, and a second mirror section, which includes a second reflection surface having a focal point at substantially the same position as the focal point of the first reflection surface and formed by part of a spheroidal surface different from that of the first reflection surface. The second reflection surface is disposed at a position where the magnetic flux density due to the magnetic field is lower than that of the first reflection surface.
(FR) La présente invention concerne un dispositif de génération de lumière ultraviolette extrême qui est pourvu d'un miroir de focalisation réfléchissant et focalisant la lumière ultraviolette extrême, et d'un aimant générant un champ magnétique. Le miroir de focalisation peut comprendre une première section de miroir incluant une première surface de réflexion formée par une partie d'une surface sphéroïdale, et une seconde section de miroir incluant une seconde surface de réflexion qui possède un foyer situé pratiquement à la même position que le foyer de la première surface de réflexion, et qui est formée par une partie d'une surface sphéroïdale différente de celle de ladite première surface de réflexion. La seconde surface de réflexion occupe une position où la densité de flux magnétique due au champ magnétique est inférieure à celle de la première surface de réflexion.
(JA) 極端紫外光生成装置は、極端紫外光を反射して集光する集光ミラーと、磁場を発生させる磁石と、を備え、前記集光ミラーは、回転楕円面の一部で形成された第1反射面を含む第1ミラー部と、前記第1反射面の焦点と略同じ位置に焦点を有し前記第1反射面と異なる回転楕円面の一部で形成された第2反射面を含み、前記第2反射面が、前記第1反射面よりも前記磁場による磁束密度が低い位置に配置された第2ミラー部と、を含んでもよい。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)